Effect of Pressure on the Microstructure of the Doped- Nitrogen Nanocrystalline Diamond Films
At a Glance
Section titled āAt a Glanceā| Metadata | Details |
|---|---|
| Publication Date | 2015-01-01 |
| Journal | Journal of Southwest University of Science and Technology |
| Authors | Lingling Xu |
| Institutions | Southwest University of Science and Technology |
Abstract
Section titled āAbstractāAdopting microwave plasma chemical vapor deposition( MPCVD) system,melamine was used to realize nanometer diamond( NCD) thin film doped N atoms deposited on single crystal silicon substrate,and the reaction gas pressure was controlled to prepare different types of NCD thin film. Transmission electron microscope( FESEM),atomic force probe microscopy( AFM) and laser Raman spectroscopy( Raman) were used to analyze the influence of different pressure on the surface structure and phase composition of doped- nitrogen NCD thin film. The results show that when the pressure increases from 8k Pa to 12 k Pa,the particle size of the film decreases and becomes more dense between particles; roughness measurement of the surface( RMS) also declines from 90. 4 nm to 40. 4 nm; diamond phase gradually transfers to SP2 phase. Continuing to increase the pressure to 15 k P,the grain size of the thin film nevertheless increases and manisfests uneven distribution; the RMS also increases to 131. 5 nm; the content of SP2 phase reaches the most. By using X- ray photoelectron spectroscopy( XPS) to examine the doped-nitrogen NCD thin film sample under 12 k P,the results show that the NCD film is mainly composed by the SP2 phase carbon content,and the effective doped- nitrogen content can reach 2. 73%.
Tech Support
Section titled āTech SupportāOriginal Source
Section titled āOriginal Sourceā- DOI: None