RECENT PROGRESS OF DIAMOND DEVICE TOWARD POWER APPLICATION
At a Glance
Section titled âAt a Glanceâ| Metadata | Details |
|---|---|
| Publication Date | 2015-08-26 |
| Authors | Julien Pernot, Kazuhiro Ikeda, Alexandre Fiori, Aboulaye Traoré, N Tatsumi |
| Institutions | Conductive Composites (United States) |
| Citations | 2 |
Abstract
Section titled âAbstractâThe state of the art of the Institut NĂ©el research activity in the field of diamond power devices will be described and discussed. The active layers of the device are based on boron-doped monocristalline (100) diamond (with doping level varying between 1014 to 1021 cm-3) grown on Ib high temperature high pressure (HPHT) diamond substrate. The progresses done on diamond/metal interface, diamond/dielectric interface, or sharp gradient doping, permit recently the fabrication of original structures and devices, which will be detailed here (Schottky diode, boron doped ÎŽ-FET and MOS capacitance).
Tech Support
Section titled âTech SupportâOriginal Source
Section titled âOriginal Sourceâ- DOI: None