Electrochemical Characteristics of Boron-doped Ultrananocrystalline Diamond Amorphous Carbon Composite Films Fabricated by Coaxial Arc Plasma Deposition
At a Glance
Section titled “At a Glance”| Metadata | Details |
|---|---|
| Publication Date | 2016-01-01 |
| Journal | 産業応用工学会論文誌 |
| Authors | 武嗣 原, 雅也 大西, 大輔 藤本, 剛 吉武 |
| Citations | 1 |
Abstract
Section titled “Abstract”Boron-doped ultrananocrystalline diamond (UNCD) amorphous carbon (a-C) composite films were fabricated by a coaxial arc plasma deposition (CAPD) method. Cyclic voltammetry measurements of deposited films showed wide electrical potential window and very low background current, which remarkably similar to conductive poly crystalline diamond (PCD) electrodes. In addition, it was confirmed that deposited films have removal effects of total organic carbon (TOC) in an ethanol water solution. Boron-doped UNCD/a-C films have potential for behaving as an electrode with wastewater treatment effects.