Tensile test of a silicon microstructure fully coated with submicrometer-thick diamond like carbon film using plasma enhanced chemical vapor deposition method
At a Glance
Section titled āAt a Glanceā| Metadata | Details |
|---|---|
| Publication Date | 2017-04-20 |
| Journal | Japanese Journal of Applied Physics |
| Authors | Wenlei Zhang, Akio Uesugi, Yoshikazu Hirai, Toshiyuki Tsuchiya, Osamu Tabata |
| Institutions | Kyoto University |
| Citations | 3 |
Abstract
Section titled āAbstractāThis paper reports the tensile properties of single-crystal silicon (SCS) microstructures fully coated with sub-micrometer thick diamond like carbon (DLC) film using plasma enhanced chemical vapor deposition (PECVD). To minimize the deformations or damages caused by non-uniform coating of DLC, which has high compression residual stress, released SCS specimens with the dimensions of 120 Āµm long, 4 Āµm wide, and 5 Āµm thick were coated from the top and bottom side simultaneously. The thickness of DLC coating is around 150 nm and three different bias voltages were used for deposition. The tensile strength improved from 13.4 to 53.5% with the increasing of negative bias voltage. In addition, the deviation in strength also reduced significantly compared to bare SCS sample.