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6CCVD Research

Note - Sample holder with open area for increased deposition rate in plasma immersion ion implantation and deposition

At a Glance

Section titled ā€œAt a Glanceā€
MetadataDetails
Publication Date2017-09-01
JournalReview of Scientific Instruments
AuthorsS. Flege, R. Hatada, A. Derepa, Christian Dietz, Wolfgang Ensinger
InstitutionsIndustrial Technology Center of Okayama Prefecture, Technical University of Darmstadt
Citations5

Abstract

Section titled ā€œAbstractā€

A sample holder with a large open area offers several benefits when used in the process of plasma immersion ion implantation and deposition in which the plasma is generated by a high voltage applied to the sample holder: The ignition voltage of the plasma is lower, and the deposition rate can be several times higher than in the case of a normal plate-like holder. There is a more pronounced edge effect regarding the film thickness. Other film properties are also affected; for diamond-like carbon films, the film structure exhibits more disorder. The hardness of the samples is similar, with the surfaces of the samples being very smooth.

Tech Support

Section titled ā€œTech Supportā€

Original Source

Section titled ā€œOriginal Sourceā€

References

Section titled ā€œReferencesā€
  1. 2000 - Handbook of Plasma Immersion Ion Implantation and Deposition

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