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Исследование структурных и морфологических свойств HPHT алмазных подложек

MetadataDetails
Publication Date2018-01-01
JournalФизика и техника полупроводников
AuthorsП.А. Юнин, П. В. Волков, Ю Н Дроздов, А.В. Колядин, С. А. Королев

AbstractThe morphological and structural properties of a series of high-pressure high-temperature (HPHT) single-crystal diamond substrates are comprehensively studied by white-light optical interference microscopy, atomic-force microscopy, and X-ray diffraction analysis. Procedures that provide a means for characterizing the substrate parameters most critical for epitaxial application with the laboratory equipment are described. It is shown that the jewelry-type characterization of diamond substrates is insufficient to assess the possibility of their use for the epitaxial growth of chemical-vapor-deposited (CVD) diamond.