High-mobility diamond field effect transistor with a monocrystalline h-BN gate dielectric
At a Glance
Section titled āAt a Glanceā| Metadata | Details |
|---|---|
| Publication Date | 2018-11-01 |
| Journal | APL Materials |
| Authors | Yosuke Sasama, Katsuyoshi Komatsu, Satoshi Moriyama, Masataka Imura, Tokuyuki Teraji |
| Institutions | National Institute for Materials Science, University of Tsukuba |
| Citations | 85 |
Abstract
Section titled āAbstractāDiamond is a wide bandgap semiconductor that can work at high temperatures and resist very high electric fields. It endures harsh environments through its physical stability and conducts heat very well. These properties make diamond suitable for the fabrication of unique electronic devices. In particular, diamond field effect transistors (FETs) have promising applications, including high-power converters for trains and electric vehicles and high-power high-frequency amplifiers for telecommunications and radar. Although high mobility is desirable for these applications, it has been difficult to achieve in diamond FETs particularly when the carrier density is high. The low mobility is most probably due to fixed and trapped charges in the non-ideal amorphous gate dielectric and at the dielectric/diamond interface. Here, we report on diamond FETs with monocrystalline hexagonal boron nitride (h-BN) as a gate dielectric. Thanks to the low density of charged impurities in monocrystalline h-BN, we obtained unprecedentedly high mobilities (>300 cm2 Vā1 sā1) for moderately high carrier densities (>5 Ć 1012 cmā2). The resulting minimum sheet resistance was exceptionally low (<3 kĪ©). Our results show that a heterostructure consisting of monocrystalline h-BN and diamond is an excellent platform with which to manufacture high-performance electronic devices.
Tech Support
Section titled āTech SupportāOriginal Source
Section titled āOriginal SourceāReferences
Section titled āReferencesā- 2008 - Diamond as an electronic material [Crossref]
- 2012 - High-current metal oxide semiconductor field-effect transistors on H-terminated diamond surfaces and their high-frequency operation [Crossref]
- 2016 - Single crystal diamond wafers for high power electronics [Crossref]
- 2017 - Diamond field-effect transistors for RF power electronics: Novel NO2 hole doping and low-temperature deposited Al2O3 passivation [Crossref]
- 2014 - C-H surface diamond field effect transistors for high temperature (400 °C) and high voltage (500 V) operation [Crossref]
- 2017 - Normally-off C-H diamond MOSFETs with partial C-O channel achieving 2-kV breakdown voltage [Crossref]
- 2002 - High carrier mobility in single-crystal plasma-deposited diamond [Crossref]
- 2014 - High carrier mobility in ultrapure diamond measured by time-resolved cyclotron resonance [Crossref]
- 2002 - Semiconductor Devices, Physics and Technology
- 2006 - Present status and future prospect of widegap semiconductor high-power devices [Crossref]