'Surface Roughness and Seeding Process Influence on Boron Doped Micro/Nanocrystalline Diamond Adhesion on Titanium Substrate'
At a Glance
Section titled āAt a Glanceā| Metadata | Details |
|---|---|
| Publication Date | 2018-11-21 |
| Journal | Trends in Textile Engineering & Fashion Technology |
| Authors | Silvia S Oishi |
| Institutions | National Institute for Space Research |
| Citations | 1 |
Abstract
Section titled āAbstractāCVD (Chemical Vapor Deposition) diamond deposition on different materials requires surface treatment such as diamond particles seeding on the substrate dispersed in an appropriate solvent by using ultrasonic agitation. On the other hand, seeding process by electrostatic attraction of nanodiamond particle have produced films with higher nucleation density compared to that obtained from ultrasonic treatment. In addition, nucleation and growth of micro/nanocrystalline boron doped diamond films (BDD/NBDD) on titanium (Ti) substrates represent a complex process, mainly due to the poor film adhesion related to the difference in the thermal expansion coefficients between the film and the substrate.