Diamond Seed Size and the Impact on Chemical Vapor Deposition Diamond Thin Film Properties
At a Glance
Section titled âAt a Glanceâ| Metadata | Details |
|---|---|
| Publication Date | 2020-05-27 |
| Journal | ECS Journal of Solid State Science and Technology |
| Authors | Tingyu Bai, Yekan Wang, Tatyana I. Feygelson, Marko J. Tadjer, Karl D. Hobart |
| Institutions | United States Naval Research Laboratory, University of Bristol |
| Citations | 17 |
Abstract
Section titled âAbstractâDiamond seeds were assessed for their role in the heterogeneous nucleation for diamond films deposited on silicon using chemical vapor deposition. Two diamond seed sizesâ4 nm and 20 nmâwere studied. The study revealed that the larger seed size, even when with a smaller seed density, produces a larger grain size near the interface region, and led to a higher in-plane thermal conductivity as measured by Raman thermography. By fine control of the seed size and density, thermal conductivity near the nucleation region can therefore be improved. This demonstrates that the seeding condition is critical to diamond film growth for thermal applications in electronic devices.