Growth mechanism analysis and controlled synthesis of diamond-like carbon
At a Glance
Section titled āAt a Glanceā| Metadata | Details |
|---|---|
| Publication Date | 2020-06-15 |
| Journal | TANSO |
| Authors | Susumu Takabayashi, Yuji Takakuwa |
| Institutions | Tohoku University, National Institute of Technology, Ariake College |
Abstract
Section titled āAbstractāDiamond-like carbon (DLC) films were synthesized by our original photoemission-assisted plasma-enhanced chemical vapor deposition (PA-PECVD) method. The discharge modes of PA-PECVD are photoemission-assisted Townsend discharge (PATD) and photoemission-assisted glow discharge (PAGD), both of which are caused by photoelectrons continuously emitted from the substrate under UV irradiation. The photoelectrons give a certain discharge-starting voltage and current area to generate a controlled plasma, different from the general Townsend and glow discharges caused by accidentally-produced electrons. We used this advantage for DLC growth analysis to present a growth model with bond rearrangement caused by the effect of ions on the growing film and its hydrogen desorption. PATD creates a precisely-doped DLC structure. A three-layer material of DLC/oxygen-doped DLC/DLC film has a very high breakdown strength compared to silicon dioxide.