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Negative Differential Resistance of n-ZnO Nanorods/p-degenerated Diamond Heterojunction at High Temperatures

MetadataDetails
Publication Date2020-07-15
JournalFrontiers in Chemistry
AuthorsDandan Sang, Jiaoli Liu, Xiaofeng Wang, Dong Zhang, Feng Ke
InstitutionsJilin University, Shandong University of Technology
Citations18
AnalysisFull AI Review Included

Negative Differential Resistance of n-ZnO Nanorods/p-degenerated Diamond Heterojunction at High Temperatures

Section titled “Negative Differential Resistance of n-ZnO Nanorods/p-degenerated Diamond Heterojunction at High Temperatures”

This study successfully fabricated and characterized an n-ZnO Nanorods (NRs)/p-degenerated diamond tunneling diode designed for high-temperature operation, focusing on Negative Differential Resistance (NDR) properties.

  • Core Achievement: Stable NDR phenomena were observed in the heterojunction at 20 °C and 80 °C, confirming its suitability for high-temperature electronic applications.
  • Material Basis: The device utilizes heavily boron-doped (p-degenerated) diamond (carrier density 1.7 x 1020 cm-3) combined with n-type ZnO NRs.
  • Performance Trend: Increasing temperature from 20 °C to 80 °C resulted in a significant increase in forward current (Ip increased by >7 times) and a reduction in the turn-on voltage (from 1.5 V to 0.7 V).
  • NDR Strength: The Peak-to-Valley Current Ratio (PVCR) decreased from 1.7 at 20 °C to 1.1 at 80 °C, indicating a weakening of the NDR effect as thermal processes become more dominant.
  • Tunneling Mechanism: At lower temperatures (20 °C and 80 °C), carrier transport is dominated by tunneling from the diamond valence band into the deep level defect band (oxygen vacancies) of the ZnO NRs.
  • Failure Mode: At 120 °C, the NDR effect completely disappeared, and the device transitioned into a standard non-degenerate p-n heterojunction, dominated by enhanced thermionic emission and diffusion current.
  • Conduction Models: High-voltage conduction adhered to Fowler-Nordheim (FN) tunneling theory, while low-voltage conduction followed direct tunneling.
ParameterValueUnitContext
Peak Current (Ip)2.6”A20 °C, Forward Bias
Peak Current (Ip)20.4”A80 °C, Forward Bias
Valley Current (Iv)1.5”A20 °C, Forward Bias
Valley Current (Iv)19.3”A80 °C, Forward Bias
PVCR1.7Dimensionless20 °C (Maximum NDR observed)
PVCR1.1Dimensionless80 °C (NDR weakened)
Turn-on Voltage (Vturn-on)1.5V20 °C
Turn-on Voltage (Vturn-on)0.7V80 °C (Reduced due to thermal effects)
P-Diamond Carrier Density1.7 x 1020cm-3Measured by Hall effect (Degenerated structure)
P-Diamond Resistivity102Ω cm2Measured by Hall effect
P-Diamond Mobility11cm2 V-1 s-1Measured by Hall effect
ZnO NR Average Length~2”mStructural analysis
ZnO NR Average Diameter~80nmStructural analysis
Diamond Film Thickness4”mHFCVD growth result
NDR Disappearance Temperature120°CTransition to rectification characteristics

The heterojunction device was fabricated using a two-step synthesis process involving Hot Filament Chemical Vapor Deposition (HFCVD) for the diamond layer and thermal evaporation for the ZnO NRs.

  • Method: 150 V bias-assisted Hot Filament Chemical Vapor Deposition (HFCVD).
  • Substrate: Silicon wafers (1 cm x 1 cm), pre-abraded with diamond paste for nucleation enhancement.
  • Filament: Spiral tantalum wire, heated to approximately 2,000 °C.
  • Growth Temperature: Substrate temperature maintained at ~700-800 °C.
  • Pressure: Total pressure set at 40 Torr.
  • Gas Flow: Methane (CH4)/Hydrogen (H2) flow rate ratio of 2.6/200 sccm.
  • Doping: Boron source was liquid B(OCH3)3, incorporated via H2 gas bubbling at a flow rate of 20 sccm.
  • Result: Diamond films displayed a thickness of 4 ”m after 4 hours of deposition.
  • Method: Thermal evaporation in a horizontal tube furnace.
  • Source Material: Mixed raw powders of ZnO and Aluminum (Al).
  • Source Temperature: Heated in the quartz tube at 850 °C.
  • Substrate Placement: P-degenerated diamond substrates were placed downstream from the source.
  • Substrate Temperature: Maintained at approximately 500 °C.
  • Pressure: Constant pressure of 6 x 104 Pa.
  • Device Structure: Tunneling diode heterojunction.
  • Negative Electrode: Transparent conductive Indium-Tin-Oxide (ITO) glass pressed onto the ZnO NRs.
  • Positive Electrode: Silver (Ag) wire employed on the p-degenerated diamond.
  • Structural Analysis: SEM, TEM, Raman spectroscopy (514.5 nm Ar+ ion laser), and X-ray diffraction (XRD) were used to confirm morphology and crystal structure.
  • Electrical Testing: Temperature-dependent I-V characteristics were measured using a Keithley Series 2400 SourceMeter Instruments.

The successful demonstration of stable NDR in a diamond-based heterojunction at elevated temperatures opens pathways for specialized electronic components in demanding environments.

  • High-Temperature Electronics: Ideal for devices requiring stable operation in high-power modules, aerospace, automotive engine control units, or deep-well drilling equipment where ambient temperatures exceed 100 °C.
  • Resonant Tunneling Diodes (RTDs): The NDR effect is crucial for RTDs, enabling ultra-high-frequency (GHz to THz) oscillators, mixers, and detectors used in advanced communication systems.
  • High-Density Logic and Memory: NDR devices can be used to construct multi-valued logic circuits, potentially simplifying complex logic gates and increasing data density in specialized memory architectures (Resistive Switching).
  • High-Power Switching: Diamond’s superior thermal conductivity (greater than silicon or GaAs) makes this heterojunction suitable for high-power switching applications, minimizing heat dissipation issues.
  • Optoelectronic Devices: Utilizing the wide bandgap properties of both ZnO and diamond for robust UV photodetectors and emitters operating in harsh, high-radiation environments.
View Original Abstract

In the present study, an n-ZnO nanorods (NRs)/p-degenerated diamond tunneling diode was investigated with regards to its temperature-dependent negative differential resistance (NDR) properties and carrier tunneling injection behaviors. The fabricated heterojunction demonstrated NDR phenomena at 20 and 80°C. However, these effects disappeared followed by the occurrence of rectification characteristics at 120°C. At higher temperatures, the forward current was increased, and the turn-on voltage and peak-to-valley current ratio (PVCR) were reduced. In addition, the underlying mechanisms of carrier tunneling conduction at different temperature and bias voltages were analyzed through schematic energy band diagrams and semiconductor theoretical models. High-temperature NDR properties of the n-ZnO NRs/p-degenerated diamond heterojunction can extend the applications of resistive switching and resonant tunneling diodes, especially in high-temperature, and high-power environments.

  1. 2018 - Facile fabrication of self-assembled ZnO nanowire network channels and its gatecontrolled UV detection [Crossref]
  2. 2011 - Resistive switching characteristics of maghemite nanoparticle assembly. J [Crossref]
  3. 2007 - Room temperature observation of negative differential resistance effect using ZnO nanocrystal structure with double Schottky barriers [Crossref]
  4. 2015 - Observation of room temperature negative differential resistance in solution synthesized ZnO nanorod [Crossref]
  5. 2007 - Physics of Semiconductor Devices
  6. 2017 - High-sensitive Ultraviolet photodetectors based on ZnO Nanorods/CdS heterostructures [Crossref]
  7. 2006 - Boron spectral density and disorder broadening in B-doped diamond [Crossref]
  8. 2013 - Epitaxial growth of ZnO nanorods on diamond and negative differential resistance of n-ZnO nanorod/p-diamond heterojunction [Crossref]
  9. 2010 - Investigation on crystalline structure, boron distribution, and residual stresses in freestanding boron-doped CVD diamond films [Crossref]
  10. 2018 - Temperature dependent negative differential resistance behavior in multiferroic metal organic framework (CH3)2NH2Mn(HCOO)3 crystals [Crossref]