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Adjoint-optimized nanoscale light extractor for nitrogen-vacancy centers in diamond

MetadataDetails
Publication Date2020-11-16
JournalNanophotonics
AuthorsRaymond Wambold, Zhaoning Yu, Yuzhe Xiao, Benjamin F. Bachman, Gabriel R. Jaffe
InstitutionsUniversity of Wisconsin–Madison
Citations18
AnalysisFull AI Review Included

The research details the design and optimization of a silicon-based Nanoscale Light Extractor (NLE) engineered to maximize the outcoupling of broadband fluorescence from shallow Nitrogen-Vacancy (NV-) centers in diamond.

  • Performance Achievement: The NLE enhances the optical output of an NV center positioned 10 nm below the diamond surface by a factor of >35x compared to unpatterned diamond.
  • Collection Efficiency: The device beams the extracted light into a narrow far-field cone (±30°), enabling high collection efficiency (~40% for NA 0.75) using low-Numerical Aperture (NA) optics.
  • Fabrication Advantage: The NLE consists of a patterned silicon layer placed directly on a flat, unpatterned diamond surface, eliminating the need for complex and potentially damaging diamond etching.
  • Design Methodology: The structure was designed using adjoint optimization combined with broadband Finite-Difference Time-Domain (FDTD) simulations, focusing on maximizing the Figure of Merit (FoM) across the entire NV emission spectrum (635-800 nm).
  • Robustness: The optimized design exhibits strong tolerance to fabrication errors (±20 nm edge deviation) and alignment errors (±20° angular misalignment), crucial for real-world implementation.
  • Material Compatibility: The optimal NLE thickness is 300 nm, compatible with standard Silicon-on-Insulator (SOI) technology and membrane transfer techniques for integration onto diamond.
ParameterValueUnitContext
Target EmitterNV- Center-Negatively charged Nitrogen-Vacancy in [100] diamond.
NV Center Depth (Optimized)10nmBelow diamond surface.
NLE MaterialSilicon (Si)-Patterned layer on diamond substrate.
NLE Thickness (Optimized)300nmDetermined via 2D optimization sweep.
Figure of Merit (FoM)~35xBroadband enhancement factor (10 nm depth).
Purcell Enhancement (Average)~3xAveraged across the 635-800 nm emission spectrum.
Collection Efficiency (Peak)~40%For NA 0.75 objective (635-670 nm range).
Beaming Angle±30°Cone angle for directed light output.
Emission Wavelength Range635 to 800nmCovers zero-phonon line (ZPL) and phonon sideband.
Robustness (Edge Deviation)±20nmTolerance to fabrication under/over-etching.
Robustness (Angular)±20°Tolerance to rotational misalignment of the NLE.
Robustness (Depth Tolerance)3xMinimum FoM enhancement maintained at 300 nm NV depth.
Minimum Feature Size40nmSet by conical blurring function radius (R).

The NLE structure was developed using an inverse design approach based on adjoint optimization and FDTD simulations, focusing on broadband performance and fabrication constraints.

  1. Simulation Environment: Finite-Difference Time-Domain (FDTD) simulations (Lumerical FDTD) were used to calculate the forward and adjoint electromagnetic fields across the target spectrum (635-800 nm).
  2. Optimization Target: The optimization maximized the Figure of Merit (FoM), defined as the spectrum-averaged extraction efficiency ($\eta(\lambda)$) weighted by the NV emission spectrum ($I_{NV}(\lambda)$).
  3. NV Emission Modeling: The unpolarized, room-temperature NV emission was modeled by incoherently summing the results from two orthogonal linear dipoles, both orthogonal to the NV axis (tilted 54.7° from the surface normal).
  4. Adjoint Source Definition: The adjoint simulation used two orthogonally polarized Gaussian beams (diffraction angle ±30°) injected from free space toward the structure, defining the desired collection cone.
  5. Topological Constraints: To ensure fabricability via top-down techniques:
    • The refractive index profile was constrained to be constant in the vertical (Z) direction.
    • The optimization was performed in 3D using a fixed, optimal height of 300 nm (determined by prior 2D sweeps).
  6. Binarization and Smoothing:
    • A conical blurring function (radius R = 40 nm) was applied iteratively to smooth the index distribution and enforce a minimum feature size suitable for electron-beam lithography.
    • A binary push function was applied iteratively to force the continuous index profile into a final binary structure (Air or Silicon).
  7. Phase Relaxation: Multiple optimization runs were performed, varying the relative phases of the forward and adjoint sources (0 to 2π in steps of π/2) to relax the phase degree of freedom and find the optimal structure.

This technology significantly enhances the efficiency of collecting photons from near-surface NV centers, directly benefiting applications where signal-to-noise ratio is limited by photon count.

  • Quantum Sensing: Provides a critical boost in sensitivity for high-spatial-resolution sensing of magnetic fields, electric fields, and temperature, especially when using shallow NV centers where extraction is typically poor due to surface proximity.
  • Quantum Communication and Computing: Improves the coupling efficiency of single photons from NV qubits into external optical systems, essential for quantum network nodes and entanglement generation.
  • Solid-State Emitter Integration: The inverse design methodology and silicon-on-diamond platform can be readily adapted to optimize light extraction for other solid-state color centers (e.g., in SiC or hexagonal boron-nitride).
  • Simplified Microscopy Systems: By directing light into a narrow cone, the NLE allows high collection efficiency using low-NA objectives, reducing the complexity, cost, and size of the required optical setup compared to high-NA oil immersion systems.
  • Diamond Material Preservation: The design avoids etching the diamond substrate, which is crucial for maintaining the high spin coherence and quantum properties of near-surface NV centers that can be degraded by surface roughness or chemical modification resulting from etching.
View Original Abstract

Abstract We designed a nanoscale light extractor (NLE) for the efficient outcoupling and beaming of broadband light emitted by shallow, negatively charged nitrogen-vacancy (NV) centers in bulk diamond. The NLE consists of a patterned silicon layer on diamond and requires no etching of the diamond surface. Our design process is based on adjoint optimization using broadband time-domain simulations and yields structures that are inherently robust to positioning and fabrication errors. Our NLE functions like a transmission antenna for the NV center, enhancing the optical power extracted from an NV center positioned 10 nm below the diamond surface by a factor of more than 35, and beaming the light into a ±30° cone in the far field. This approach to light extraction can be readily adapted to other solid-state color centers.