Plasma etching for carbon materials by inward RF plasma apparatus
At a Glance
Section titled āAt a Glanceā| Metadata | Details |
|---|---|
| Publication Date | 2022-05-05 |
| Journal | Transactions of the IMF |
| Authors | Takumi KAMESHIMA, Yukihiro Sakamoto |
| Institutions | Chiba Institute of Technology |
| Citations | 2 |
Abstract
Section titled āAbstractāDiamond has high wear resistance and shape stability, and poly-crystalline chemical vapour deposition (CVD) diamond is difficult to mechanically process because of cleavage and wear anisotropy. On the other hand, diamond can be removed under an oxidising atmosphere with O2 as the etching gas by reactive ion etching which is processing using plasma. In this study, the fabrication of an inward radio frequency (RF) plasma apparatus and the possibility of a removal process for carbon materials such as CVD diamond film and graphite plate by using it were investigated. OES, confocal laser scanning microscope and Raman spectroscopy were used for the evaluation of the etching. It was confirmed that the inward RF plasma apparatus fabricated could be applied to plasma etching for carbon materials. In addition, it was suggested that carbon materials were etched as CO with O2 in the atmosphere, and amorphous structures were etched preferentially over crystalline ones.
Tech Support
Section titled āTech SupportāOriginal Source
Section titled āOriginal SourceāReferences
Section titled āReferencesā- 1979 - āThe identification of molecular spectraā