Synthesis of High Quality Transparent Nanocrystalline Diamond Films on Glass Substrates Using a Distributed Antenna Array Microwave System
At a Glance
Section titled âAt a Glanceâ| Metadata | Details |
|---|---|
| Publication Date | 2022-09-20 |
| Journal | Coatings |
| Authors | Chaimaa Mahi, Ovidiu Brinza, Riadh Issaoui, Jocelyn Achard, Fabien Bénédic |
| Institutions | Sorbonne Université, Université Sorbonne Paris Nord |
| Citations | 10 |
| Analysis | Full AI Review Included |
Executive Summary
Section titled âExecutive SummaryâThis study demonstrates the successful synthesis of high-quality, transparent Nanocrystalline Diamond (NCD) films on temperature-sensitive glass substrates using a Distributed Antenna Array (DAA) Microwave Plasma Assisted Chemical Vapor Deposition (MPACVD) system.
- Low-Temperature Synthesis: NCD films were grown effectively at substrate temperatures as low as 265 °C, enabling deposition on low melting-point materials like borosilicate and soda-lime glass.
- High Optical Purity: The resulting films exhibit a high diamond sp3 fraction (up to 84%) and a wide optical band gap (3.55 eV), ensuring high transparency in the visible range.
- Excellent Transparency: Transmittance of the NCD/glass system is consistently greater than 75% across the 400-900 nm wavelength range, with a low absorption coefficient (less than 103 cm-1).
- Ultra-Smooth Surface: The films exhibit extremely low root mean square (Rms) roughness, typically below 10 nm, which minimizes light scattering and is ideal for optical coatings.
- Scalability: The DAA system, featuring 16 coaxial sources arranged in a matrix, provides a large and homogeneous plasma (>600 cm2), promising scalability for industrial applications.
- Surface Modification: NCD coating successfully shifts the surface wettability from hydrophilic (bare glass) to a more hydrophobic regime (contact angle increased to ~76°).
Technical Specifications
Section titled âTechnical Specificationsâ| Parameter | Value | Unit | Context |
|---|---|---|---|
| Reactor Type | Distributed Antenna Array (DAA) MPACVD | N/A | 16 coaxial microwave plasma sources |
| Microwave Power | 3 | kW | Total input power |
| Operating Pressure | 0.35 | mbar | Low-pressure synthesis |
| Substrate Temperature (Tsub) | 265 - 400 | °C | Range investigated; best results <300 °C |
| Gas Mixture Composition | 96.4% H2, 2.6% CH4, 1% CO2 | % | Standard NCD growth mixture |
| Total Gas Flow Rate | 50 | sccm | Constant flow rate |
| Maximum Growth Rate | 55 | nm·h-1 | Achieved at 400 °C |
| Typical Rms Roughness | <10 | nm | Range 4.9-10.5 nm |
| Diamond Grain Size (XRD) | 12 ± 3 | nm | Characteristic of nanocrystalline structure |
| Diamond Purity (sp3 fraction) | 79 - 84 | % | Calculated from Raman spectra |
| Optical Transmittance (T) | >75 | % | Measured between 400 and 900 nm |
| Optical Band Gap (Eg) | 3.55 ± 0.35 | eV | High value indicating high purity |
| Absorption Coefficient (α) | <103 | cm-1 | Low absorption in the visible range (480-900 nm) |
| Water Contact Angle (NCD) | ~76 | ° | Shift from hydrophilic (bare glass) to hydrophobic |
Key Methodologies
Section titled âKey MethodologiesâThe NCD films were synthesized using a Distributed Antenna Array (DAA) microwave reactor, which utilizes 16 coaxial microwave plasma sources arranged in a 2D matrix to achieve large-area, homogeneous plasma (>600 cm2).
- Substrate Preparation: Borosilicate (250 ”m thick) and soda-lime (1 mm thick) glass slides were used.
- Seeding: Substrates were seeded by spin coating a colloidal solution containing 25 nm diamond powder (SYP-GAF-0-0.05) diluted in water with Polyvinyl Alcohol (PVA) to prevent coagulation.
- Deposition Parameters:
- Gas mixture: 96.4% H2, 2.6% CH4, 1% CO2 (50 sccm total flow).
- Pressure: 0.35 mbar.
- Microwave Power: 3 kW.
- Substrate Temperature Control: Regulated via a graphite heater embedded in a molybdenum holder (Tsub varied 265-400 °C).
- Morphological and Structural Characterization:
- Scanning Electron Microscopy (SEM): Used to assess surface homogeneity and the presence of nanometric spherulitic aggregates.
- Atomic Force Microscopy (AFM): Used to analyze surface topography and measure Rms roughness (tapping mode, 1 x 1 ”m2 area).
- X-ray Diffraction (XRD): Used to confirm crystalline diamond presence and estimate grain size (~12 nm) using a modified Scherrer equation.
- Raman Spectroscopy (473 nm excitation): Used to determine phase purity, identify sp3 diamond and sp2 non-diamond phases (graphite D/G bands, TPA bands), and calculate the sp3 fraction (Equation 1).
- Optical and Surface Characterization:
- UV-Visible Reflectometry: Used to determine film thickness, transmittance (Tsys), and reflectance (Rsys).
- Absorption Coefficient (α) and Band Gap (Eg): Calculated iteratively from T and R measurements (Equations 3-6), followed by Taucâs model fitting (Equation 7).
- Wettability: Measured using a drop shape analyzer (KRĂSS DSA25) to record the water contact angle (2 ”L dH2O drop).
Commercial Applications
Section titled âCommercial ApplicationsâThe ability to deposit highly transparent, ultra-smooth, and protective diamond films on large areas of low-temperature substrates (like glass) makes this DAA technology highly relevant for several optical and protective coating markets.
- Optical Devices and Windows:
- High-power CO2 laser windows (leveraging diamondâs transparency and thermal properties).
- Protective coatings for optical materials, including optical fibers and lenses.
- Consumer Optics:
- Ophthalmic glasses (lenses) requiring scratch resistance and high clarity.
- Outdoor operating optics and displays (due to high transparency and enhanced hydrophobicity).
- Energy and Photovoltaics:
- Anti-reflecting and protective coatings for solar cells, improving efficiency and durability.
- Large-Scale Industrial Coating:
- The DAA systemâs inherent scalability (large plasma area >600 cm2) allows for the industrial manufacturing of diamond coatings on large glass panels or complex 3D substrates.
View Original Abstract
Diamond is a material of choice for the fabrication of optical windows and for protective and anti-reflecting coatings for optical materials. For these kinds of applications, the diamond coating must have a high purity and a low surface roughness to guarantee a high transparency. It should also be synthesized at low surface temperature to allow the deposition on low melting-point substrates such as glasses. In this work, the ability of a Distributed Antenna Array (DAA) microwave system operating at low temperature and low pressure in H2/CH4/CO2 gas mixture to synthesize nanocrystalline diamond (NCD) films on borosilicate and soda-lime glass substrates is investigated aiming at optical applications. The influence of the substrate temperature and deposition time on the film microstructure and optical properties is examined. The best film properties are obtained for a substrate temperature below 300 °C. In these conditions, the growth rate is around 50 nm·hâ1 and the films are homogeneous and formed of spherical aggregates composed of nanocrystalline diamond grains of 12 nm in size. The resulting surface roughness is then very low, typically below 10 nm, and the diamond fraction is higher than 80%. This leads to a high transmittance of the NCD/glass systems, above 75%, and to a low absorption coefficient of the NCD film below 103 cmâ1 in the visible range. The resulting optical band gap is estimated at 3.55 eV. The wettability of the surface evolves from a hydrophilic regime on the bare glass substrates to a more hydrophobic regime after NCD deposition, as assessed by the increase of the measured contact angle from less than 55° to 76° after the deposition of 100 nm thick NCD film. This study emphasizes that such transparent diamond films deposited at low surface temperature on glass substrate using the DAA microwave technology can find applications for optical devices.
Tech Support
Section titled âTech SupportâOriginal Source
Section titled âOriginal SourceâReferences
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