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Ultratough single crystal boron-doped diamond

MetadataDetails
Publication Date2023-01-23
JournalOSTI OAI (U.S. Department of Energy Office of Scientific and Technical Information)
AuthorsRussell J. Hemley, Ho‐kwang Mao, Chih‐shiue Yan, Qi Liang
InstitutionsCarnegie Institution for Science

The invention relates to a single crystal boron doped CVD diamond that has a toughness of at least about 22 MPa m.sup.1/2. The invention further relates to a method of manufacturing single crystal boron doped CVD diamond. The growth rate of the diamond can be from about 20-100 .mu.m/h.