The Microzone Structure Regulation of Diamond/Cu-B Composites for High Thermal Conductivity - Combining Experiments and First-Principles Calculations
At a Glance
Section titled âAt a Glanceâ| Metadata | Details |
|---|---|
| Publication Date | 2023-02-28 |
| Journal | Materials |
| Authors | Zhongnan Xie, Wei Xiao, Hong Guo, Boyu Xue, Hui Yang |
| Institutions | State Key Laboratory of Nonferrous Metals and Processes, General Research Institute for Nonferrous Metals (China) |
| Citations | 9 |
| Analysis | Full AI Review Included |
Executive Summary
Section titled âExecutive Summaryâ- High Performance Achieved: Diamond/Cu composites alloyed with Boron (B) achieved a maximum thermal conductivity (TC) of 694 W/(mK) at an optimal B content of 0.5 wt.%. This represents a 2.5-fold increase over the baseline diamond/Cu composite (261 W/(mK)).
- Interfacial Carbide Formation: Boron atoms diffuse toward the diamond/Cu interface (diffusion barrier 0.87 eV) and are highly favorable to segregate (segregation energy -1.10 eV), leading to the exothermic formation of a B4C carbide interlayer.
- Phonon Transmission Bridge: First-principles calculations confirm that the B4C interlayer acts as a crucial phonon transmission bridge. Its phonon spectrum (5-34 THz) effectively overlaps the low-frequency Cu spectrum (0-8 THz) and the high-frequency diamond spectrum (10-40 THz).
- Microzone Structure Enhancement: HRTEM revealed that the B4C layer forms a unique nano-cone or âdentateâ structure extending from the diamond surface, which further enhances the efficiency of phononic transport across the interface.
- Heat Transfer Mechanism: The enhancement in TC is primarily attributed to improved phononic transport via the B4C bridge and dentate structure, as the electronic contribution to heat transfer across the interface was calculated to be relatively insignificant (1.13 G0/nm2).
- Process Optimization: Increasing the Boron content beyond 0.5 wt.% (e.g., 1.0 wt.%) leads to thicker B4C layers, which subsequently increases interfacial thermal resistance and reduces the overall composite TC (down to 647 W/(mK)).
Technical Specifications
Section titled âTechnical Specificationsâ| Parameter | Value | Unit | Context |
|---|---|---|---|
| Maximum Thermal Conductivity (K) | 694 | W/(mK) | Diamond/Cu-0.5 wt.%B composite |
| Baseline Thermal Conductivity (K) | 261 | W/(mK) | Diamond/Cu composite (0 wt.%B) |
| Optimal Boron Content | 0.5 | wt.% | Alloyed into Cu matrix |
| Diamond Content | 60 | vol.% | Reinforcing phase content |
| Infiltration Temperature | 1250 | °C | Vacuum Pressure Infiltration (VPI) |
| Diamond Grain Size | 100 | ”m | Single-crystal diamond filler |
| Boron Diffusion Energy Barrier | 0.87 | eV | Migration path between OISs in bulk Cu |
| Boron Segregation Energy (Eseg) | -1.10 | eV | Favorable segregation to the diamond/Cu interface |
| B4C Formation Enthalpy (Ef) | -1.36 | eV/atom | Exothermic reaction (B + C â B4C) |
| B4C Phonon Frequency Range | 5 to 34 | THz | Phonon transmission bridge |
| Copper Phonon Frequency Range | 0 to 8 | THz | Bulk Cu |
| Diamond Phonon Frequency Range | 10 to 40 | THz | Bulk diamond |
| Diamond/Cu Interface Conductance (Electronic) | 1.13 G0/nm2 | G0/nm2 | Calculated electronic contribution (relatively low) |
| Cu Metal Conductance (Electronic) | 13.63 G0/nm2 | G0/nm2 | Reference pure Cu metal |
| Lattice Mismatch (Calculated) | 1.65 | % | Cu(111)/Diamond(111) interface model |
Key Methodologies
Section titled âKey Methodologiesâ- Composite Preparation: Diamond/Cu-B composites were fabricated using Vacuum Pressure Infiltration (VPI). Diamond preforms were infiltrated with Cu-B alloys (0, 0.5, and 1.0 wt.% B) at 1250 °C.
- Microstructure Characterization: Scanning Electron Microscopy (SEM) and High-Resolution Transmission Electron Microscopy (HRTEM) were used to analyze fracture surfaces and the nano-scale structure of the diamond-B4C-Cu interface.
- Phase Identification: X-ray Diffraction (XRD) and Energy Dispersive Spectroscopy (EDS) confirmed the presence of the newly formed B4C phase near the diamond interface.
- Thermal Measurement: Thermal diffusivity (α) was measured using a thermal conductivity tester (LFA447). Thermal conductivity (K) was calculated using the formula K = α·Ïpc·Cp.
- First-Principles DFT Calculations (VASP): Density Functional Theory (DFT) was employed to determine the stability of Boron occupation sites in Cu, calculate the Boron diffusion energy barrier (using the Nudged Elastic Band, NEB, method), and analyze segregation energies.
- Electronic Transport Modeling: The transmission coefficients and electrical conductance were calculated using the Nanodcal software package within the Non-Equilibrium Greenâs Function-DFT (NEGF-DFT) framework.
- Phonon Analysis: Phonon Density of States (PDOS) for bulk materials (Diamond, Cu, B4C) and solid solutions (Cu4B) were obtained using the Cambridge Serial Total Energy Package (CASTEP) to model phononic coupling efficiency.
Commercial Applications
Section titled âCommercial Applicationsâ- High-Density Integrated Circuits (ICs): Used as advanced heat spreaders and heat sinks for microprocessors and high-performance computing (HPC) chips, addressing the bottleneck of increasing power density.
- Power Electronics Modules: Thermal substrates for high-power semiconductor devices (e.g., IGBTs, MOSFETs) in electric vehicles (EVs) and renewable energy systems, where efficient cooling is essential for reliability.
- Radio Frequency (RF) and Microwave Devices: Substrates for high-power GaN and GaAs amplifiers used in 5G infrastructure and radar systems, leveraging the high TC to maintain junction temperature stability.
- Laser and Optoelectronics: Thermal management components for high-power laser diodes and LED arrays, preventing thermal degradation and maintaining light output efficiency.
- Aerospace and Defense Systems: Applications requiring lightweight, high-stiffness, and high-thermal-conductivity materials for reliable operation in extreme environments.
View Original Abstract
The interface microzone characteristics determine the thermophysical properties of diamond/Cu composites, while the mechanisms of interface formation and heat transport still need to be revealed. Here, diamond/Cu-B composites with different boron content were prepared by vacuum pressure infiltration. Diamond/Cu-B composites up to 694 W/(mK) were obtained. The interfacial carbides formation process and the enhancement mechanisms of interfacial heat conduction in diamond/Cu-B composites were studied by HRTEM and first-principles calculations. It is demonstrated that boron can diffuse toward the interface region with an energy barrier of 0.87 eV, and these elements are energetically favorable to form the B4C phase. The calculation of the phonon spectrum proves that the B4C phonon spectrum is distributed in the range of the copper and diamond phonon spectrum. The overlapping of phonon spectra and the dentate structure together enhance the interface phononic transport efficiency, thereby improving the interface thermal conductance.
Tech Support
Section titled âTech SupportâOriginal Source
Section titled âOriginal SourceâReferences
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