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Ultrathin boron-doped diamond – surface-wave-plasma synthesis of semi-conductive nanocrystalline boron-doped diamond layers at low temperature

MetadataDetails
Publication Date2025-01-01
JournalMaterials Advances
AuthorsP. Ashcheulov, M. Davydova, Taylor A, P. Hubík, A. Kovalenko
InstitutionsInstitute of Physics of the Slovak Academy of Sciences, Fraunhofer Institute for Applied Solid State Physics
AnalysisFull AI Review Included

This study details the development and characterization of ultrathin nanocrystalline Boron-Doped Diamond (BDD) layers synthesized using a Surface-Wave-Plasma (SWP) technique within a Microwave Linear Antenna Plasma Enhanced CVD (MW-LA-PECVD) system.

  • Low-Temperature Synthesis: BDD layers were successfully fabricated at a low substrate temperature of 500 °C, significantly lower than conventional CVD methods (700-1000 °C). This enables coating of temperature-sensitive substrates (e.g., high-temperature glass, quartz, and silicon).
  • Ultrathin Dimensions: The resulting nanocrystalline BDD films were consistently ultrathin, with thicknesses ranging from 124 nm to 167 nm, supporting high optical transparency and potential mechanical flexibility.
  • Tunable Electrical Properties: By systematically varying the gas-phase CO2 concentration (0.1% to 2%) and B/C ratio (60 to 60,000 ppm), the electrical resistivity was tuned across the semi-conductive range, from 1.85 Ω cm up to 303 kΩ cm.
  • High Quality and Smoothness: Despite the low temperature and ultrathin nature, the layers exhibited low RMS surface roughness (6-8 nm) and maintained a wide electrochemical stability window (2.5-3.0 V).
  • CO2 Optimization: Increasing CO2 concentration was shown to gradually decrease boron incorporation and increase electrical resistivity, providing a fine-tuning mechanism for targeting moderate semi-conductive characteristics.
  • Cost-Effective and Scalable: SWP synthesis offers a simple, scalable fabrication route suitable for large-area deposition (wafer-size), contributing to cost-effective BDD electrode manufacturing.
ParameterValueUnitContext
Synthesis MethodMW-LA-PECVDN/ASurface-Wave-Plasma (SWP) technique
Substrate Temperature500 ± 20°CAchieved via plasma heat (unassisted holder)
Process Pressure0.25mbarStandard operating pressure
Microwave Power2 x 3kWTotal power input
Layer Thickness (Range)124 - 167nmUltrathin nanocrystalline BDD films
Growth Rate (Range)18 - 28nm/hCalculated for 6-hour deposition time
RMS Surface Roughness (Range)6.2 - 7.6nmMeasured via AFM; very smooth surfaces
Electrical Resistivity (Range)1.85 - 303,500Ω cmTunable semi-conductive range
Boron Concentration (Range)6.07 x 1019 - 7.1 x 1020atoms/cm3Measured via GDOES
Electrochemical Stability Window2.5 - 3.0VMeasured in 1 M KCl aqueous electrolyte
Charge Transfer Sluggishness (ΔEp)550 - 1200mVMeasured using Fe(CN)63-/4- redox probe

The ultrathin nanocrystalline BDD layers were fabricated using a custom-built MW-LA-PECVD reactor (SWP technique).

  • Substrates: High-temperature glass (Corning Eagle XG), quartz, and conductive Si (p-type, <0.005 Ω cm resistivity).
  • Seeding: Substrates were seeded using spin coating of NanoAmando nanodiamond dispersion (0.2 g L-1).
  • Gas Admixture:
    • Hydrogen (H2): 94-96%
    • Methane (CH4): 4%
    • Carbon Dioxide (CO2): Varied from 0.1% to 2% (Optimization variable).
    • Boron Precursor (B2H6): 7500 ppm in H2, resulting in B/C ratios of 60, 600, 6000, and 60,000 ppm.
  • Process Duration: 6 hours for all samples to allow for direct comparison of growth rates.
  • Structural and Morphological Analysis:
    • Scanning Electron Microscopy (SEM): Used for top-view morphology analysis, cross-sectional thickness measurement, and statistical grain size distribution (using image processing techniques).
    • Atomic Force Microscopy (AFM): Used to determine RMS surface roughness.
  • Compositional Analysis:
    • Glow Discharge Optical Emission Spectroscopy (GDOES): Used to measure the total boron concentration (atoms/cm3) and depth profiles.
    • Raman Spectroscopy: Used to assess diamond quality (sp3 vs. sp2 bonding) and confirm boron incorporation (via diamond peak shift).
  • Functional Analysis:
    • Electrical Resistivity: Measured using the differential van der Pauw (vdP) method at room temperature.
    • Electrochemical Performance: Cyclic Voltammetry (CV) performed in a three-electrode setup (Ag/AgCl reference, Pt counter) using 1 mM Fe(CN)63-/4- redox marker in 1 M KCl electrolyte.

The ultrathin, low-temperature synthesized BDD layers are highly versatile, targeting applications requiring chemical stability, electrical conductivity, and optical transparency.

  • Electrochemistry:
    • Electrodes for Water Treatment: Utilizing the wide electrochemical window (2.5-3.0 V) for oxidative degradation of pollutants or electrochemical reduction of carbon dioxide.
    • High-Performance Sensors: BDD’s robustness makes it ideal for biosensing and chemical sensing in harsh environments.
  • Opto-electronics and Display Technology:
    • Transparent Conductive Electrodes: The ultrathin nature (150 nm) and low roughness (6-8 nm) result in high optical transparency and minimal light scattering, suitable for advanced display or photovoltaic devices.
  • Advanced Manufacturing and Integration:
    • Flexible Electronics: Low-temperature synthesis (500 °C) allows BDD deposition onto temperature-sensitive materials, facilitating the development of soft electronics and flexible devices.
    • 3D Conformal Coatings: The ability to deposit ultrathin films conformally onto complex geometrical shapes with nanometer resolution is critical for micro- and nanofabrication.
  • Gas Sensing:
    • High-Stability Gas Sensors: Leveraging the robust chemical and thermal stability of BDD films.
View Original Abstract

Ultrathin boron-doped diamond layers, synthesized at 500 °C, provide a cost-effective, energy-efficient material with moderate semi-conductive properties for advanced functional uses.