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6CCVD Research

Optimization of high-performance multilayer monochromator at the Diamond Light Source

At a Glance

Section titled “At a Glance”
MetadataDetails
Publication Date2025-05-01
JournalJournal of Physics Conference Series
AuthorsWadwan Singhapong, Arindam Majhi, Wai Jue Tan, Lucia Alianelli, Chris Bowen
Citations1

Abstract

Section titled “Abstract”

Abstract Multilayer monochromators offer substantial advantages over traditional crystal-based monochromators. By integrating a multilayer structure, these monochromators can efficiently deliver a high photon flux density and speed up the data acquisition processes, thereby significantly enhancing synchrotron-based experiments. This study focuses on advancing the development of multilayer optics used for the monochromator upgrade of the KMX I24 beamline at the Diamond Light Source. The multilayer monochromator is designed to operate optimally at energies of 12.4 keV and 22.4 keV to maximize the flux. Two multilayer systems including NiV/B 4 C and Ru/B 4 C are fabricated using the newly developed Multilayer Deposition System at the Diamond Light Source under the optimized condition. Results indicate that replacing Ni with NiV improves the sputtering stability and interface roughness, while reactive sputtering of Ru/B 4 C enhances the interface quality of the multilayer. A reflectivity of 92.8% and 89.2% is achieved at 8.048 keV for a 150-bilayer of NiV/B 4 C and a 70-bilayer of Ru/B 4 C, respectively.

Tech Support

Section titled “Tech Support”

Original Source

Section titled “Original Source”

References

Section titled “References”
  1. 2011 - A double multilayer monochromator for the B16 Test beamline at the Diamond Light Source [Crossref]
  2. 2024 - Multilayer Optics for Synchrotron Applications [Crossref]
  3. 2020 - Beamline B21: high-throughput small-angle X-ray scattering at Diamond Light Source [Crossref]
  4. 2017 - Double multilayer monochromators for upgraded ESRF beamlines
  5. 2024 - Structural and optical performance of NiV/Ti multilayer mirrors for Z-pinch plasma diagnostic at the wavelength region of 350-450 eV [Crossref]
  6. 1998 - IMD—Software for modeling the optical properties of multilayer films
  7. 2024 - Development of an advanced in-line multilayer deposition system at Diamond Light Source [Crossref]
  8. 2022 - GenX 3: the latest generation of an established tool [Crossref]
  9. 2023 - Investigation of NiV-based multilayers for the high energy x-ray probe
  10. 2018 - Nitridated Ru/B4C multilayer mirrors with improved interface structure, zero stress, and enhanced hard X-ray reflectance [Crossref]

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