Effect of Deposition Voltage on Tensile Properties of Single Crystal Silicon Microstructure Fully Coated by Plasma CVD DLC Film
At a Glance
Section titled āAt a Glanceā| Metadata | Details |
|---|---|
| Publication Date | 2017-01-01 |
| Journal | The Proceedings of Mechanical Engineering Congress Japan |
| Authors | Wenlei Zhang, Akio Uesugi, Yoshikazu Hirai, Toshiyuki Tsuchiya, Osamu Tabata |
| Institutions | Kyoto University, Aichi Institute of Technology |
Abstract
Section titled āAbstractāThis paper reports on the effect of deposition bias voltage on tensile properties of single crystal silicon microstructure fully coated by plasma CVD diamond like carbon (DLC) film. DLC film with the thickness of 150 nm was uniformly coated on silicon microstructure of 120 Ī¼m long, 4Ī¼m wide and 5 Ī¼m thick. The result shows that by increasing of bias voltage, sp2 phase and hydrogen content decreased, while sp3 phase increased. The average tensile strength of DLC coated structure shows 13.2-29.6% higher values compared to that of the bare silicon structure and the -400 V bias voltage gave the highest strength of 3.94 GPa. Moreover, the Weibull modulus increased with higher bias voltage, which indicates smaller deviations in strength.