Growth of mirror-like ultra-nanocrystalline diamond (UNCD) films by a facile hybrid CVD approach
At a Glance
Section titled āAt a Glanceā| Metadata | Details |
|---|---|
| Publication Date | 2017-03-31 |
| Journal | Plasma Science and Technology |
| Authors | Shuo Yang, Weidong Man, Jilei Lyu, Xiong Xiao, Zhiheng You |
| Institutions | Wuhan Institute of Technology, Ningbo Institute of Industrial Technology |
| Citations | 4 |
Abstract
Section titled āAbstractāIn this study, growth of mirror-like ultra-nanocrystalline diamond (UNCD) films by a facile hybrid CVD approach was presented. The nucleation and deposition of UNCD films were conducted in microwave plasma CVD (MPCVD) and direct current glow discharge CVD (DC GD CVD) on silicon substrates, respectively. A very high nucleation density (about 1 Ć 1011 nuclei cmā2) was obtained after plasma pretreatment. Furthermore, large area mirror-like UNCD films of Ī¦ 50 mm were synthesized by DC GD CVD. The thickness and grain size of the UNCD films are 24 Ī¼m and 7.1 nm, respectively. In addition, the deposition mechanism of the UNCD films was discussed.