A Recent Patent on Microwave Plasma Chemical Vapor-Deposited Diamond Film on Cutting Tools
At a Glance
Section titled āAt a Glanceā| Metadata | Details |
|---|---|
| Publication Date | 2017-07-27 |
| Journal | Recent Patents on Mechanical Engineering |
| Authors | Ling Zhang, Dejun Kong |
| Institutions | Changzhou University |
Abstract
Section titled āAbstractāBackground: Among the various technologies for the chemical vapor deposition of diamond, Microwave Plasma CVD (MPCVD) is a widely used technique for high quality diamond films. It has been proven that the growth rate and quality of diamond can be improved by increasing the plasma power density and gas pressure. Keywords: Cutting tools, diamond film, experimenetal system, MPCVD, surface quality, technological parameter.