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6CCVD Research

Deposition and Patterning of Polycrystalline Diamond Films Using Traditional Photolithography and Reactive Ion Etching

At a Glance

Section titled ā€œAt a Glanceā€
MetadataDetails
Publication Date2017-09-15
JournalCoatings
AuthorsStepan Linnik, Vitalii Okhotnikov, A. Gaydaychuk
InstitutionsNational Research Tomsk State University, Tomsk Polytechnic University
Citations1

Abstract

Section titled ā€œAbstractā€

Given the exceptional characteristics of diamond films, they have become increasingly popular in the fields of medicine, microelectronics, and detector electronics. However, despite all the advantages, there are many technological problems that complicate their widespread application and impose limitations on diamond use in technological processes. In this study, we proposed a new technique for obtaining a complex topology of polycrystalline diamond coatings by selective seeding of the substrate by nucleation centers and subsequent surface treatment with reactive ion etching to reduce the number of parasitic particles. As a result, diamond films were obtained with a high particle concentration in the film region and high repeatability of the pattern. Moreover, parasitic particles influenced neutralization in areas where film coverage was not needed. The effect of the diamond nanoparticle concentration in a photoresist and the effect of reactive ion etching on the formation of a continuous film and the removal of parasitic nucleation centers were examined. The relative simplicity, low power consumption, and high efficiency of this method make it attractive for both industrial and scientific applications.

Tech Support

Section titled ā€œTech Supportā€

Original Source

Section titled ā€œOriginal Sourceā€

References

Section titled ā€œReferencesā€
  1. 1993 - Diamond coatings
  2. 2005 - Diamond semiconductor technology for RF device applications [Crossref]
  3. 1989 - Selective deposition of diamond films [Crossref]
  4. 2013 - Fabrication of diamond microstructures by using dry and wet etching methods [Crossref]
  5. 2017 - Highly Manufacturable Deep (Sub-Millimeter) Etching Enabled High Aspect Ratio Complex Geometry Lego-Like Silicon Electronics [Crossref]
  6. 2011 - Laser induced nanoablation of diamond materials [Crossref]
  7. 2016 - Selective deposition of polycrystalline diamond films using photolithography with addition of nanodiamonds as nucleation centers [Crossref]

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