Influence of the Thin-Film Ag Electrode Deposition Thickness on the Current Characteristics of a CVD Diamond Radiation Detector
At a Glance
Section titled âAt a Glanceâ| Metadata | Details |
|---|---|
| Publication Date | 2018-12-30 |
| Journal | Journal of Radiation Protection and Research |
| Authors | Chae-Min Ban, Chul-Yong Lee, ByungâHyuk Jun |
| Institutions | Korea Atomic Energy Research Institute |
Abstract
Section titled âAbstractâBackground We investigated the current characteristics of a thin-film Ag electrode on a chemical vapor deposition (CVD) diamond. The CVD diamond is widely recognized as a radiation detection material because of its high tolerance against high radiation, stable response to various dose rates, and good sensitivity. Additionally, thin-film Ag has been widely used as an electrode with high electrical conductivity. Materials and Methods Considering these properties, the thin-film Ag electrode was deposited onto CVD diamonds with varied deposition thicknesses (âÂÂ50/98/152/257 nm); subsequently, the surface thickness, surface roughness, leakage current, and photo-current were characterized. Results and Discussion The leakage current was found to be very low, and the photo-current output signal was observed as stable for a deposited film thickness of 98 nm; at this thickness, a uniform and constant surface roughness of the deposited thin-film Ag electrode were obtained. Conclusion We found that a CVD diamond radiation detector with a thin-film Ag electrode deposition thickness close to 100 nm exhibited minimal leakage current and yielded a highly stable output signal. Keywords: CVD diamond, Radiation detector, Thin-film Ag electrode, Leakage current, Photo-current
Tech Support
Section titled âTech SupportâOriginal Source
Section titled âOriginal SourceâReferences
Section titled âReferencesâ- 1966 - Ionization currents in diamonds during irradiation with 500 to 1,000-kev electrons