Crystal growth and CMP of 1 inch heteroepitaxial diamond substrates
At a Glance
Section titled âAt a Glanceâ| Metadata | Details |
|---|---|
| Publication Date | 2019-01-01 |
| Authors | G. Turri, Koji Koyama, Yuki Kawamata, SeongâWoo Kim |
Abstract
Section titled âAbstractâHeteroepitaxial diamond growth method and Chemical Mechanical Planarization (CMP) technologies have been developed. Large area heteroepitaxial diamond with 1-inch diameter was successfully demonstrated on Sapphire wafer. CMP was applied to the heteroepitaxial diamond and its effect was evaluated by the implanted MOSFET device.