Plasma-Chemical Deposition of Diamond-Like Films onto the Surface of Heavily Doped Single-Crystal Diamond
At a Glance
Section titled “At a Glance”| Metadata | Details |
|---|---|
| Publication Date | 2019-09-01 |
| Journal | Semiconductors |
| Authors | А. И. Охапкин, P. A. Yunin, М. Н. Дроздов, S. A. Korolyov, S. A. Kraev |
| Institutions | Institute for Physics of Microstructures |
| Citations | 3 |
Abstract
Section titled “Abstract”The plasma-chemical deposition of diamond-like carbon (DLC) films onto heavily boron-doped single-crystal p-type diamond (the concentration ~1020 cm-3) in CH4 + Ar plasma is conducted. The deposition rate is 7 nm min-1. The elemental composition and properties of the films are studied in detail. It is found that the films are enriched with hydrogen, possess a density of 2.4 g cm-3, and exhibit an ultrasmooth surface (with a roughness of 0.4 ± 0.2 nm).