The design and performance of hydrogen-terminated diamond metal-oxide-semiconductor field-effect transistors with high k oxide HfO2
At a Glance
Section titled āAt a Glanceā| Metadata | Details |
|---|---|
| Publication Date | 2020-01-08 |
| Journal | Micro and Nano Engineering |
| Authors | Chi Sun, Tingting Hao, Junjie Li, Haitao Ye, Changzhi Gu |
| Institutions | University of Chinese Academy of Sciences, Songshan Lake Materials Laboratory |
| Citations | 10 |
Abstract
Section titled āAbstractāThe hydrogen plasma treatment of single crystal diamond was carried out by microwave plasma chemical vapor deposition equipment, and the normally-off hydrogen-terminated diamond field-effect transistors (FETs) with different gate lengths were prepared by atomic layer deposition (ALD) which deposited HfO2 as gate oxide. We systematically investigated the influence of hydrogen treatment duration, gate length, channel length and gate oxide material HfO2 on the hydrogen-terminated diamond FETs. Results show that the HfO2 gate oxide allows the fabricated FETs to exhibit a normally-off characteristic, which is advantageous for the practical application of power devices. The drain-source current, threshold voltage, subthreshold swing, and Ion/Ioff of the fabricated diamond FETs with gate length of 5 μm are 11 mA/mm, ā2.9 V, 3 mS/mm, and 106, respectively. With the increase of the gate length (Lg = 5 μm, 20 μm, 50 μm), the drain current density, threshold voltage, and transconductance of the devices decrease, which is due to the higher channel resistance and inhomogeneity of the hydrogen surface termination. Keywords: H-diamond, MOSFET, high-k, Normally-off
Tech Support
Section titled āTech SupportāOriginal Source
Section titled āOriginal SourceāReferences
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