Nitrogen-Vacancy Color Centers Created by Proton Implantation in a Diamond
At a Glance
Section titled âAt a Glanceâ| Metadata | Details |
|---|---|
| Publication Date | 2021-02-09 |
| Journal | Materials |
| Authors | Mariusz MrĂłzek, Mateusz Schabikowski, Marzena MituraâNowak, Janusz Lekki, M. MarszaĆek |
| Institutions | Jagiellonian University, Institute of Nuclear Physics, Polish Academy of Sciences |
| Citations | 19 |
| Analysis | Full AI Review Included |
Executive Summary
Section titled âExecutive SummaryâThis study investigates the controlled creation and spin relaxation properties of negatively charged Nitrogen-Vacancy (NV-) color centers in diamond using high-energy proton implantation.
- Controlled NV- Creation: NV- ensembles were successfully created in Type Ib HPHT diamond ([N] ~ 50 ppm) using 1.8 MeV proton implantation, followed by 900 °C vacuum annealing.
- Depth Specificity: The high-energy proton beam generated vacancies primarily in a narrow layer peaking sharply at approximately 20 ”m depth, enabling spatial control over NV- layer formation.
- Dose Dependence: Implantation doses ranged widely from 1.5 x 1013 to 1.5 x 1017 ions/cm2, allowing for the tailoring of NV concentration and defect density.
- Spin Relaxation Analysis: Both longitudinal (T1) and transverse (T2) spin relaxation rates increased linearly (on a logarithmic scale) with implantation dose, confirming that defect density limits spin lifetime.
- Performance Range: Measured T1 times decreased from 6 ms to 1.25 ms, and T2 times decreased from 2.5 ”s to 1.1 ”s across the tested dose range.
- Limitation Identified: The highest implantation doses (1.5 x 1017 ions/cm2) caused significant crystal damage, leading to a drop in fluorescence signal and ODMR contrast, limiting the maximum useful dose.
- Engineering Value: The technique is versatile for preparing microscale NV sensors, particularly thin, dense layers required for high-sensitivity magnetometry and bio-sensing applications.
Technical Specifications
Section titled âTechnical Specificationsâ| Parameter | Value | Unit | Context |
|---|---|---|---|
| Diamond Type | Type Ib mono-crystalline HPHT | N/A | (100)-oriented, Element Six source |
| Initial Nitrogen Concentration | ~50 | ppm | Concentration in the bulk diamond matrix |
| Implantation Particle | Proton (H+) | N/A | Used to create lattice vacancies |
| Implantation Energy | 1.8 | MeV | Energy of the focused proton beam |
| Implantation Depth (Peak Vacancy) | ~20 | ”m | Depth profile simulated using SRIM 2013 |
| Implantation Dose Range | 1.5 x 1013 to 1.5 x 1017 | ions/cm2 | Range tested across 8 spots |
| Annealing Temperature | 900 | °C | Performed in vacuum to stimulate vacancy migration |
| Annealing Time | 2 | h | Duration of post-implantation thermal treatment |
| Longitudinal Relaxation Time (T1) Range | 6 to 1.25 | ms | Decreases with increasing dose |
| Transverse Relaxation Time (T2) Range | 2.5 to 1.1 | ”s | Decreases with increasing dose |
| T1 Rate Dependence Slope | 0.16 | N/A | Slope of 1/T1 vs. dose (logarithmic scale) |
| T2 Rate Dependence Slope | 0.08 | N/A | Slope of 1/T2 vs. dose (logarithmic scale) |
| Displacement Threshold Energy | 37.5 | eV | Used in SRIM simulation for (100) direction |
| ODMR Contrast | Decreases | % | Drop observed at highest implantation doses |
| Microwave Pi Pulse Length | 50 | ns | Used for T1 and T2 measurements |
Key Methodologies
Section titled âKey MethodologiesâThe NV- creation and characterization process involved precise material selection, controlled implantation, thermal processing, and advanced optical/spin measurements:
- Sample Acquisition and Selection: Two 3.0 x 3.0 x 0.3 mm3 Type Ib HPHT diamond samples (HEN1 and HEN2) with an initial nitrogen concentration of ~50 ppm were used.
- Proton Implantation: Protons were implanted on the polished side using a Van de Graaff accelerator at 1.8 MeV. The beam spot diameter was approximately 20 ”m. Eight distinct spots were implanted across the two samples, covering doses from 1013 to 1017 ions/cm2.
- Thermal Annealing: Samples were annealed in a vacuum system at 900 °C for 2 hours to promote vacancy diffusion and association with nitrogen atoms, forming NV centers.
- Optical Characterization (PL/Raman): Fluorescence spectra (PL) were collected using a confocal microscope setup (532 nm green laser excitation) to confirm NV center formation (Zero Phonon Line at 637 nm). Raman spectroscopy was used to assess crystal damage.
- Optically Detected Magnetic Resonance (ODMR): ODMR contrast measurements were performed to assess the quality and density of the NV ensembles.
- Longitudinal Relaxation (T1) Measurement: T1 was measured using the ârelaxation in the dark method,â employing a sequence of optical polarization and microwave pulses.
- Transverse Relaxation (T2) Measurement: T2 (phase coherence time) was measured using the Hahn spin-echo sequence, utilizing a microwave Ï pulse length of 50 ns.
Commercial Applications
Section titled âCommercial ApplicationsâThe ability to create dense, thin, and spatially controlled layers of NV- centers with characterized spin properties is critical for several emerging quantum and sensing technologies:
- Quantum Magnetometry: NV ensembles are used as highly sensitive magnetic field sensors. Dense, thin layers maximize the signal (sensitivity scales as (NsT2)-1/2), crucial for wide-field magnetic imaging.
- Bio-Magnetometry and Imaging: Using NV layers in thin diamond plates for nanoscale sensing and imaging of magnetic fields generated by living cells or biological systems.
- Quantum Information Processing: The phase coherence time (T2) constrains the minimum gate operation time, making materials with optimized T2 essential for diamond-based quantum computing architectures.
- Temperature Sensing: NV centers act as robust, localized temperature probes, useful in microscale thermal management and biological environments.
- Integrated Circuit (IC) Current Imaging: Thin NV layers can be used for high-resolution imaging of current flow in integrated circuits.
- Shallow NV Layer Fabrication: The proton implantation technique, while creating deep vacancies (~20 ”m), provides a foundation for creating relatively uniform NV depth profiles in thin nitrogen-doped layers (0.1-10 ”m) overgrown on high-quality diamond substrates.
View Original Abstract
We present an experimental study of the longitudinal and transverse relaxation of ensembles of negatively charged nitrogen-vacancy (NVâ) centers in a diamond monocrystal prepared by 1.8 MeV proton implantation. The focused proton beam was used to introduce vacancies at a 20 ””m depth layer. Applied doses were in the range of 1.5Ă1013 to 1.5Ă1017 ions/cm2. The samples were subsequently annealed in vacuum which resulted in a migration of vacancies and their association with the nitrogen present in the diamond matrix. The proton implantation technique proved versatile to control production of nitrogen-vacancy color centers in thin films.
Tech Support
Section titled âTech SupportâOriginal Source
Section titled âOriginal SourceâReferences
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