Preparation of W-Plated Diamond and Improvement of Thermal Conductivity of Diamond-WC-Cu Composite
At a Glance
Section titled “At a Glance”| Metadata | Details |
|---|---|
| Publication Date | 2021-03-07 |
| Journal | Metals |
| Authors | Xulei Wang, Xinbo He, Zhiyang Xu, Xuanhui Qu |
| Institutions | University of Science and Technology Beijing |
| Citations | 12 |
| Analysis | Full AI Review Included |
Executive Summary
Section titled “Executive Summary”This research successfully developed a high-performance Diamond-WC-Cu composite for advanced thermal management applications, achieving high density and superior thermal conductivity (TC) through optimized surface modification and infiltration techniques.
- Core Achievement: A Diamond-WC-Cu composite with 60 vol% diamond achieved a high thermal conductivity of 874 W·m-1·K-1.
- Interface Optimization: Tungsten (W) plating on diamond particles was achieved using the powder covering sintering method (1100 °C, 90 min), resulting in a dense, uniform W coating of approximately 900 nm.
- Mechanism: During composite fabrication, the W coating reacted with diamond carbon to form a stable tungsten carbide (WC) transition layer, which significantly improved the wettability between the non-wetting diamond and the copper matrix.
- Interface Resistance: The calculated total interface thermal resistance (Rint) was drastically reduced to 2.11 × 10-8 m2·K·W-1 due to the WC layer formation.
- Fabrication Method: Composites were prepared using cyclic vacuum pressure infiltration (VPI), yielding a high relative density of >98%.
- Modeling Validation: The experimental TC value closely matched theoretical predictions from the Hasselman-Johnson (H-J) and Differential Effective Medium (DEM) models, confirming the effectiveness of the interface modification.
Technical Specifications
Section titled “Technical Specifications”| Parameter | Value | Unit | Context |
|---|---|---|---|
| Achieved Thermal Conductivity (TC) | 874 | W·m-1·K-1 | Diamond-WC-Cu composite (60 vol% diamond) |
| Relative Density | >98 | % | Final Diamond-WC-Cu composite |
| Diamond Particle Size (Reinforcement) | 100 | µm | Artificial single crystal diamond (140/170 mesh) |
| Copper Powder Particle Size (Matrix) | 50 | µm | Pure copper powder (300 mesh) |
| W Coating Thickness (Optimal) | 900 | nm | Prepared by powder covering sintering (1100 °C, 90 min) |
| Interface Thermal Resistance (Rint) | 2.11 × 10-8 | m2·K·W-1 | Calculated total Rint due to WC transition layer |
| Diamond Volume Fraction Tested | 50 to 70 | vol% | Range of final composite compositions |
| Copper Matrix TC (Reference) | 400 | W·m-1·K-1 | Red copper baseline |
| Diamond TC (Reference) | 2000 | W·m-1·K-1 | Room temperature |
| WC TC (Reference) | 120 | W·m-1·K-1 | Tungsten Carbide |
| Cu/Diamond Contact Angle (Uncoated) | 122-129 | ° | Indicating poor wettability |
Key Methodologies
Section titled “Key Methodologies”The composite preparation involved two main stages: W-plating of diamond particles and cyclic vacuum pressure infiltration (VPI) of the composite.
1. Diamond Surface Modification (W-Plating)
Section titled “1. Diamond Surface Modification (W-Plating)”The powder covering sintering method was optimized to create a dense and uniform W coating, which subsequently forms the WC transition layer.
- Pre-Treatment (Cleaning/Roughening):
- Boiling/Stirring in 10 wt% NaOH aqueous solution for 15 min.
- Boiling/Stirring in 30 wt% dilute HNO3 aqueous solution for 30 min.
- Drying at 100 °C.
- Sintering Process (Optimal Parameters):
- Mixture: Diamond particles, WO3 powder, and W powder mixed for 3-5 h.
- Atmosphere: Vacuum condition (4-6 Pa).
- Heating Rate: 10 °C/min.
- Temperature: 1100 °C (Optimal plating temperature).
- Holding Time: 90 min (Optimal holding time).
- Result: Formation of elemental W coating, which reacts during infiltration to form WC (Tungsten Carbide).
2. Diamond-WC-Cu Composite Fabrication (Cyclic VPI)
Section titled “2. Diamond-WC-Cu Composite Fabrication (Cyclic VPI)”The cyclic vacuum pressure infiltration method was used to ensure high density and uniform infiltration of the copper melt into the diamond preform.
- Preform Preparation:
- W-plated diamond mixed with 1-2 wt% Polyvinyl Alcohol (PVA) binder.
- Pre-pressing in graphite mold at 8.5 MPa for 2 min.
- Pre-degassing/Drying in oven at 150 °C for 4-5 h.
- Matrix Preparation: Pure copper powder compacted at 80 MPa for 5 min to form a strong Cu body.
- Infiltration Cycle (SGL1700 Vacuum Tube Furnace):
- Heat system to infiltration temperature (1200 °C).
- Turn off vacuum pump.
- Fill with Argon gas to 0.5 MPa (Pressure maintained for 10 min).
- Vacuum infiltrate (Ultimate vacuum maintained for 5 min).
- The “vacuum-argon gas” cycle was repeated for 1 h total to promote penetration and eliminate pore defects.
Commercial Applications
Section titled “Commercial Applications”The Diamond-WC-Cu composite, characterized by its high thermal conductivity and low thermal expansion coefficient (inherent to diamond), is highly suitable for demanding thermal management applications in modern electronics and aerospace.
- High-Power Electronic Packaging: Used as heat sinks and substrates for high-power density devices where traditional materials (Al, Cu, Mo/Cu) fail to dissipate heat effectively.
- Semiconductor Circuits: Substrates for integrated circuits (ICs) and microelectronic components requiring stable operation under high thermal loads.
- Aerospace Technology: Thermal management components in lightweight, high-integration aerospace systems where minimizing weight and maximizing heat dissipation are critical.
- Thermal Interface Materials (TIMs): Advanced composite materials used to bridge the gap between heat sources (chips) and heat sinks.
- Power Modules: Heat spreaders for IGBTs (Insulated Gate Bipolar Transistors) and other power electronics.
View Original Abstract
The tungsten (W)-plated diamond process was explored and optimized. A dense and uniform tungsten coating with a thickness of 900 nm was successfully prepared by the powder covering sintering method. The Diamond-WC-Cu composite with high density and high thermal conductivity were successfully prepared by cyclic vacuum pressure infiltration. The microstructure and composition of the W-plated diamond particles were analyzed. The effect of tungsten coating on the microstructure and thermal conductivity of the Diamond-WC-Cu composite was investigated. After calculation, the interface thermal resistance of the composite forming the tungsten carbide transition layer is 2.11 × 10−8 m2∙K∙W−1. The thermal conductivity average value of the Diamond-WC-Cu composite with a diamond volume fraction of 60% reaches 874 W∙m−1∙K−1, which is close to the theoretical prediction value of Hasselman-Johnson (H-J) model and differential effective medium (DEM) model. Moreover, the Maxwell-Eucken (M-E) model, H-J model, and DEM model were used to evaluate the thermal conductivity of the Diamond-WC-Cu composite.
Tech Support
Section titled “Tech Support”Original Source
Section titled “Original Source”References
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