Shallow NV centers augmented by exploiting n-type diamond
At a Glance
Section titled âAt a Glanceâ| Metadata | Details |
|---|---|
| Publication Date | 2021-03-10 |
| Journal | Carbon |
| Authors | Aya Watanabe, Tetsuri Nishikawa, Hiromitsu Kato, Masahiro Fujie, Masanori Fujiwara |
| Institutions | Kyoto University, National Institute of Advanced Industrial Science and Technology |
| Citations | 34 |
| Analysis | Full AI Review Included |
Executive Summary
Section titled âExecutive Summaryâ- Core Achievement: Demonstrated significant enhancement of spin-coherence time (T2), charge state stability, and creation yield for shallow Nitrogen-Vacancy (NV) centers (~15 nm depth) formed by ion implantation into phosphorus-doped n-type diamond.
- T2 Extension: The average T2 in the n-type diamond (325.7 ”s) was over 1.7 times longer than in the non-doped reference diamond (184.6 ”s). The longest T2 measured (579.0 ”s) approaches the theoretical limit imposed by the natural abundance 13C nuclear spin bath (~0.6 ms).
- Defect Suppression Mechanism: The extension of T2 is attributed to the suppression of paramagnetic defects (like multi-vacancy or vacancy-impurity complexes) generated during ion implantation, achieved through Coulomb repulsion provided by the charged defects in the n-type material.
- Creation Yield Improvement: The density of created 15NV centers improved by more than twofold in the phosphorus-doped sample compared to the non-doped reference, confirming the effectiveness of defect-charging during implantation.
- Charge State Stabilization: While the average NV- population ratio was similar between samples (~0.74), the n-type diamond showed a significant population of highly stable centers (8 out of 78 measured centers had an NV- population > 0.8), supporting the stabilization effect.
- Significance: These enhancements, achieved within a diamond semiconductor platform, are critical for the development and nano-fabrication of future integrated quantum devices, sensing, and spintronic applications.
Technical Specifications
Section titled âTechnical Specificationsâ| Parameter | Value | Unit | Context |
|---|---|---|---|
| NV Center Depth (Peak) | ~15 | nm | Simulated depth via SRIM |
| Longest T2 (P-doped, Sample I) | 579.0 ± 28.7 | ”s | Shallow NV center performance |
| Average T2 (P-doped, Sample I) | 325.7 ± 148.2 | ”s | 1.7x improvement over non-doped reference |
| Average T2 (Non-doped, Sample II) | 184.6 ± 76.5 | ”s | Reference sample performance |
| T2 Limiting Factor (Bulk) | ~0.6 | ms | Limited by natural abundant 13C nuclear spins |
| 15N Ion Implantation Energy | 10 | keV | Used for shallow NV creation |
| 15NV Creation Density (Sample I) | (27.5 ± 17.1) / 100 | ”m2 | More than twofold improvement |
| Phosphorus Concentration (Sample I) | 5 x 1016 | cm-3 | CVD grown n-type layer |
| P-doped Layer Thickness | 7 x 102 | nm | CVD grown layer |
| Average NV- Population Ratio (Sample I) | 0.746 ± 0.017 | N/A | Charge state stability (NV-/NV0) |
| Highest Observed NV- Population (Sample I) | 0.92 | N/A | Single NV center measurement |
| P1 Center Concentration (Sample II) | (2.6 ± 0.1) x 1016 | cm-3 | Estimated via EPR (~0.14 ppm) |
| Annealing Temperature | 800 | °C | Post-implantation NV creation |
| 13C Natural Abundance | 1.1 | % | Used in methane source gas |
Key Methodologies
Section titled âKey Methodologiesâ- Material Growth: A thin film of phosphorus-doped n-type diamond (Sample I) was grown onto a IIa (111) HPHT diamond substrate using microwave plasma-enhanced Chemical Vapor Deposition (CVD).
- Doping Specification: The CVD process targeted a phosphorus concentration of 5 x 1016 cm-3 and a layer thickness of approximately 700 nm. Methane with natural 13C abundance (1.1%) was used.
- Reference Sample: Sample II was a pure IIa (111) HPHT diamond, serving as a non-doped reference.
- Ion Implantation: Nitrogen isotope (15N) ions were simultaneously implanted into both samples to create shallow NV centers.
- Kinetic Energy: 10 keV.
- Implantation Temperature: 600 °C.
- Implanted Density: ~5 x 108 atoms cm-2.
- Depth Simulation: The peak depth of the 15N ions was simulated to be around 15 nm using the ion-implantation Monte-Carlo simulator (SRIM).
- Annealing and Cleaning: Samples were annealed at 800 °C for 30 minutes, followed by washing with hot acid to remove surface contaminants.
- Spin Coherence Measurement (T2): T2 was measured using Hahn-echo sequences, applying a static magnetic field of 3.2 mT. Acoustic optical modulators were used to suppress background illumination.
- Charge State Stability Measurement: Nondestructive single-shot charge-state measurements were performed using weak 593-nm laser irradiation (3-”W) to observe stochastic transitions between NV0 and NV-.
- NV Density Measurement: The NV creation yield was determined by counting the number of 15NV centers observed via confocal microscopy in a unit area.
Commercial Applications
Section titled âCommercial Applicationsâ- Integrated Quantum Processors: The ability to create high-quality, shallow NV centers in a semiconductor (n-type diamond) matrix is essential for integrating spin qubits with electronic and photonic components on a chip.
- Nanoscale Quantum Sensing: Extended T2 times directly translate to higher sensitivity and resolution for diamond-based quantum sensors used in magnetic field, electric field, and temperature measurements at the nanometer scale.
- High-Resolution NMR/ESR: Shallow NV centers with long coherence times are critical for performing nanoscale nuclear magnetic resonance (NMR) and electron spin resonance (ESR) spectroscopy, enabling chemical structure analysis of minute samples.
- Spintronics: Utilizing the stable spin properties of NV centers in the n-type diamond platform for developing novel room-temperature spintronic devices and memory elements.
- Single-Photon Sources: Improved creation yield and stable NV- charge state enhance the efficiency and reliability of diamond-based light-emitting diodes (LEDs) and single-photon sources required for quantum communication.
Tech Support
Section titled âTech SupportâOriginal Source
Section titled âOriginal SourceâReferences
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