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Shallow NV centers augmented by exploiting n-type diamond

MetadataDetails
Publication Date2021-03-10
JournalCarbon
AuthorsAya Watanabe, Tetsuri Nishikawa, Hiromitsu Kato, Masahiro Fujie, Masanori Fujiwara
InstitutionsKyoto University, National Institute of Advanced Industrial Science and Technology
Citations34
AnalysisFull AI Review Included
  • Core Achievement: Demonstrated significant enhancement of spin-coherence time (T2), charge state stability, and creation yield for shallow Nitrogen-Vacancy (NV) centers (~15 nm depth) formed by ion implantation into phosphorus-doped n-type diamond.
  • T2 Extension: The average T2 in the n-type diamond (325.7 ”s) was over 1.7 times longer than in the non-doped reference diamond (184.6 ”s). The longest T2 measured (579.0 ”s) approaches the theoretical limit imposed by the natural abundance 13C nuclear spin bath (~0.6 ms).
  • Defect Suppression Mechanism: The extension of T2 is attributed to the suppression of paramagnetic defects (like multi-vacancy or vacancy-impurity complexes) generated during ion implantation, achieved through Coulomb repulsion provided by the charged defects in the n-type material.
  • Creation Yield Improvement: The density of created 15NV centers improved by more than twofold in the phosphorus-doped sample compared to the non-doped reference, confirming the effectiveness of defect-charging during implantation.
  • Charge State Stabilization: While the average NV- population ratio was similar between samples (~0.74), the n-type diamond showed a significant population of highly stable centers (8 out of 78 measured centers had an NV- population > 0.8), supporting the stabilization effect.
  • Significance: These enhancements, achieved within a diamond semiconductor platform, are critical for the development and nano-fabrication of future integrated quantum devices, sensing, and spintronic applications.
ParameterValueUnitContext
NV Center Depth (Peak)~15nmSimulated depth via SRIM
Longest T2 (P-doped, Sample I)579.0 ± 28.7”sShallow NV center performance
Average T2 (P-doped, Sample I)325.7 ± 148.2”s1.7x improvement over non-doped reference
Average T2 (Non-doped, Sample II)184.6 ± 76.5”sReference sample performance
T2 Limiting Factor (Bulk)~0.6msLimited by natural abundant 13C nuclear spins
15N Ion Implantation Energy10keVUsed for shallow NV creation
15NV Creation Density (Sample I)(27.5 ± 17.1) / 100”m2More than twofold improvement
Phosphorus Concentration (Sample I)5 x 1016cm-3CVD grown n-type layer
P-doped Layer Thickness7 x 102nmCVD grown layer
Average NV- Population Ratio (Sample I)0.746 ± 0.017N/ACharge state stability (NV-/NV0)
Highest Observed NV- Population (Sample I)0.92N/ASingle NV center measurement
P1 Center Concentration (Sample II)(2.6 ± 0.1) x 1016cm-3Estimated via EPR (~0.14 ppm)
Annealing Temperature800°CPost-implantation NV creation
13C Natural Abundance1.1%Used in methane source gas
  1. Material Growth: A thin film of phosphorus-doped n-type diamond (Sample I) was grown onto a IIa (111) HPHT diamond substrate using microwave plasma-enhanced Chemical Vapor Deposition (CVD).
  2. Doping Specification: The CVD process targeted a phosphorus concentration of 5 x 1016 cm-3 and a layer thickness of approximately 700 nm. Methane with natural 13C abundance (1.1%) was used.
  3. Reference Sample: Sample II was a pure IIa (111) HPHT diamond, serving as a non-doped reference.
  4. Ion Implantation: Nitrogen isotope (15N) ions were simultaneously implanted into both samples to create shallow NV centers.
    • Kinetic Energy: 10 keV.
    • Implantation Temperature: 600 °C.
    • Implanted Density: ~5 x 108 atoms cm-2.
  5. Depth Simulation: The peak depth of the 15N ions was simulated to be around 15 nm using the ion-implantation Monte-Carlo simulator (SRIM).
  6. Annealing and Cleaning: Samples were annealed at 800 °C for 30 minutes, followed by washing with hot acid to remove surface contaminants.
  7. Spin Coherence Measurement (T2): T2 was measured using Hahn-echo sequences, applying a static magnetic field of 3.2 mT. Acoustic optical modulators were used to suppress background illumination.
  8. Charge State Stability Measurement: Nondestructive single-shot charge-state measurements were performed using weak 593-nm laser irradiation (3-”W) to observe stochastic transitions between NV0 and NV-.
  9. NV Density Measurement: The NV creation yield was determined by counting the number of 15NV centers observed via confocal microscopy in a unit area.
  • Integrated Quantum Processors: The ability to create high-quality, shallow NV centers in a semiconductor (n-type diamond) matrix is essential for integrating spin qubits with electronic and photonic components on a chip.
  • Nanoscale Quantum Sensing: Extended T2 times directly translate to higher sensitivity and resolution for diamond-based quantum sensors used in magnetic field, electric field, and temperature measurements at the nanometer scale.
  • High-Resolution NMR/ESR: Shallow NV centers with long coherence times are critical for performing nanoscale nuclear magnetic resonance (NMR) and electron spin resonance (ESR) spectroscopy, enabling chemical structure analysis of minute samples.
  • Spintronics: Utilizing the stable spin properties of NV centers in the n-type diamond platform for developing novel room-temperature spintronic devices and memory elements.
  • Single-Photon Sources: Improved creation yield and stable NV- charge state enhance the efficiency and reliability of diamond-based light-emitting diodes (LEDs) and single-photon sources required for quantum communication.
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