Advanced AFM nanomachining - high aspect repairs
At a Glance
Section titled āAt a Glanceā| Metadata | Details |
|---|---|
| Publication Date | 2021-08-23 |
| Authors | Maria J. Cadena, Tod Robinson, Marty Klos |
| Institutions | Bruker (United States) |
| Citations | 2 |
Abstract
Section titled āAbstractāProgress is aggressively being made to advance nanomachining photomask repair technology to the next level of performance. This next level would allow for the dimensional modification of surfaces using diamond AFM tips (NanoBits) with nominal aspect ratios (ARās) greater than or equal to 1.3 (including 1.8) in the smallest features in production. Prior work along these lines will be presented with new results from a novel process with comparison to established nanomachining processes. These results will evaluate test repairs on the most advanced photomasks currently in production including OMOG and EUV.
Tech Support
Section titled āTech SupportāOriginal Source
Section titled āOriginal SourceāReferences
Section titled āReferencesā- 2008 - Using nanomachining to repair photomasks for the 32nm node and beyond