Ultratough CVD single crystal diamond and three dimensional growth thereof
At a Glance
Section titled “At a Glance”| Metadata | Details |
|---|---|
| Publication Date | 2023-01-23 |
| Journal | OSTI OAI (U.S. Department of Energy Office of Scientific and Technical Information) |
| Authors | Russell J. Hemley, Ho‐kwang Mao, Chih‐shiue Yan |
Abstract
Section titled “Abstract”The invention relates to a single-crystal diamond grown by microwave plasma chemical vapor deposition that has a toughness of at least about 30 MPa m.sup.1/2. The invention also relates to a method of producing a single-crystal diamond with a toughness of at least about 30 MPa m.sup.1/2. The invention further relates to a process for producing a single crystal CVD diamond in three dimensions on a single crystal diamond substrate.
Tech Support
Section titled “Tech Support”Original Source
Section titled “Original Source”- DOI: None