Skip to content

Interfacial Heat Transport in Semiconducting Heterostructures

MetadataDetails
Publication Date2023-03-01
JournalProceedings of the World Congress on Momentum, Heat and Mass Transfer
AuthorsZhixiong Guo
InstitutionsRutgers, The State University of New Jersey
AnalysisFull AI Review Included

This research addresses the critical challenge of heat dissipation in high-power semiconducting heterostructures, focusing on reducing Interfacial Thermal Boundary Resistance (TBR).

  • Core Problem Addressed: Mitigating high TBR caused by inherent epilayers in standard Gallium Nitride (GaN)-on-diamond heterostructures, which limits the performance of high-power electronics.
  • Material Focus: Diamond is utilized as a high-performance heat spreader integrated with GaN semiconductor devices.
  • Epilayer Analysis: The study investigates the detrimental interfacial effect and thickness dependence of intermediate epilayers on thermal dissipation across the diamond/GaN interface.
  • c-BN Introduction: Cubic Boron Nitride (c-BN) is identified as a highly promising alternative material, possessing both diamond-like thermal properties and suitability for optoelectronic fabrication.
  • Performance Achievement: Interfacial TBR was significantly reduced when c-BN was used to replace either the diamond cap or the GaN substrate layer.
  • Key Breakthrough: The research demonstrates that c-BN can be grown directly on diamond without an intermediate epilayer, resulting in an unprecedented low TBR at the diamond/c-BN interface.

The abstract provides qualitative findings regarding material performance and interfacial resistance rather than specific numerical data (e.g., TBR values in W/m2K).

ParameterValueUnitContext
Primary Application FocusThermal ManagementN/AHigh-power electronics and GaN-on-diamond devices.
Desirable Heat SpreaderDiamondN/AUsed for quickly dissipating large amounts of heat.
Alternative MaterialCubic Boron Nitride (c-BN)N/APossesses diamond-like thermal properties.
Performance MetricThermal Boundary Resistance (TBR)N/AQuantifies resistance across the diamond/GaN interface.
Epilayer EffectThickness DependentN/AEpilayer thickness significantly affects TBR.
c-BN Substitution ResultReduced TBRN/AObserved when c-BN replaced GaN or Diamond cap.
Optimal InterfaceDiamond/c-BNN/AAchieved unprecedented low TBR via direct growth.
c-BN SuitabilityPromisingN/AMaterial for fabricating optoelectronic devices.

The study focuses on analyzing and modeling the thermal performance of various material interfaces, particularly concerning the presence and role of intermediate layers.

  1. Interfacial Thermal Analysis: Conducted a fundamental investigation to understand and quantify the interfacial thermal boundary resistance (TBR) across the baseline diamond/GaN heterostructure.
  2. Epilayer Effect Study: Analyzed the thermal impact of an inherent epilayer (composed of different substrates) situated between the GaN and diamond layers.
  3. Thickness Dependence Modeling: Determined the effect of varying the thickness of the intermediate epilayer on the overall TBR of the heterostructure.
  4. Material Substitution Testing: Evaluated the thermal performance changes resulting from replacing the standard diamond cap or the GaN substrate with cubic Boron Nitride (c-BN).
  5. Direct Growth Feasibility: Investigated and confirmed the ability to directly grow c-BN on diamond, thereby eliminating the need for a performance-limiting epilayer and achieving optimal interfacial coupling.

This research directly impacts the design and manufacturing of high-performance electronic and optoelectronic devices requiring efficient heat removal.

  • High-Power Radio Frequency (RF) Electronics: Essential for improving the reliability and power density of GaN-on-diamond transistors used in 5G/6G base stations, satellite communications, and radar systems.
  • Advanced Thermal Management Solutions: Development of superior heat spreaders and substrates utilizing the diamond/c-BN interface for applications where traditional GaN/diamond interfaces are thermally limited.
  • Optoelectronic Device Fabrication: Utilizing c-BN as a substrate or active layer material due to its combined thermal stability and suitability for fabricating high-efficiency light-emitting diodes (LEDs) and lasers.
  • Semiconductor Manufacturing Optimization: Implementation of direct growth techniques for c-BN on diamond, streamlining fabrication processes by removing the complex and thermally resistive epilayer step.
  • Extreme Environment Computing: Creation of robust, high-temperature electronic components that leverage the intrinsic thermal properties of diamond and c-BN for reliable operation under high thermal loads.
View Original Abstract

Heat dissipation through semiconducting heterostructures is of technological importance and fundamental research interest.Diamond is a desirable heat spreader, for integrating with semiconductors to dissipate quickly large amount of heat generated in electronics.The rapid development of GaN-on-diamond devices holds much promise for thermal management of high-power electronics and devices.Hitherto, the interfacial effect of an inherent epilayer between GaN and diamond to thermal dissipation is less investigated.One aim of this study is to understand and analyze the interfacial thermal boundary resistance (TBR) across a diamond/GaN heterostructure with an epilayer of different substrates.The thickness effect of epilayer is also revealed.Besides, c-BN is drawing increasing attention because it not only owns diamond-like thermal properties but also is a promising material for fabricating optoelectronic devices.It was found that the interfacial TBR reduced when the diamond cap or the GaN substrate was replaced by the c-BN.Further, c-BN can be directly grown on diamond without use of epilayer, resulting in an unprecedented low TBR in the diamond/c-BN interface.