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Creation of NV Centers in Diamond under 155 MeV Electron Irradiation

MetadataDetails
Publication Date2023-11-20
JournalAdvanced Physics Research
AuthorsElena Losero, V. Goblot, Yuchun Zhu, Hossein Babashah, Victor Boureau
InstitutionsÉcole Polytechnique FĂ©dĂ©rale de Lausanne, Deutsches Elektronen-Synchrotron DESY
Citations4
AnalysisFull AI Review Included

This research explores the use of extremely high-energy (155 MeV) electron irradiation for creating high-density, negatively charged Nitrogen-Vacancy (NV-) centers in bulk diamond, offering significant advantages for quantum sensing applications.

  • Efficiency Breakthrough: The 155 MeV irradiation process demonstrated a 60-fold higher yield of NV- creation per electron compared to the conventional 200 keV low-energy method, using the same HPHT substrate and fluence.
  • Macroscopic Volume Processing: The high energy allows for exceptional penetration depth, estimated to be greater than 10 cm in diamond. This enables the batch irradiation of hundreds of stacked substrates, drastically reducing processing costs and time.
  • Sensitivity Enhancement: The treatment increased the NV- concentration in a nitrogen-rich HPHT diamond by over three orders of magnitude (up to 0.6 ppm) across the entire 3 mm sample depth, leading to a projected shot-noise limited sensitivity gain of ~45 times.
  • Quality Preservation: The resulting NV ensembles maintained high quality, exhibiting unaffected ODMR contrast and linewidth, and achieving a near-ideal charge state conversion efficiency (Ο > 0.95) in the highly irradiated region.
  • Modeling Advancement: A new simulation model was developed to accurately predict vacancy concentration across all energy regimes (keV to hundreds of MeV), crucially incorporating secondary cascade processes prevalent at ultra-high energies.
  • Lattice Integrity: Raman spectroscopy confirmed that the high-energy irradiation and annealing process did not heavily affect the overall crystal structure, although increased background PL suggests the creation of infrared-emitting vacancy-related defects.
ParameterValueUnitContext
High Energy (HE) Irradiation155MeVElectron beam energy (ARES accelerator)
Low Energy (LE) Irradiation200keVElectron beam energy (TEM)
HE Target Fluence1.5 · 1018e/cm2Sample 1 (HPHT)
LE Fluence Range1 · 1016 to 5 · 1020e/cm2TEM irradiation range
HPHT Substrate [N]≀200ppmInitial substitutional Nitrogen concentration
CVD Substrate [N]≀1ppmInitial substitutional Nitrogen concentration
Max NV- Concentration (155 MeV)0.6ppmAchieved in HPHT sample (x=0)
Vacancy Creation Yield (155 MeV vs 200 keV)~60fold higherPer electron, same substrate/fluence
Projected Sensitivity Gain (155 MeV)~45timesCompared to pristine HPHT sample
Charge State Conversion Efficiency (Ο)>0.95N/A[NV-]/[NVtot] in highly irradiated region
Annealing Temperature800°CPost-irradiation thermal annealing
Annealing Duration4hPost-irradiation thermal annealing
Estimated Penetration Depth (155 MeV)>10cmSimulation result in diamond
T1 Relaxation Time Range (155 MeV)2.5 to 3.2msMeasured across the irradiated region
Carbon Displacement Threshold Energy~35eVMinimum energy to create a vacancy
NV- ZPL Peak638nmZero Phonon Line
NV° ZPL Peak575nmZero Phonon Line
  1. Simulation Model Development:

    • An in-house Monte Carlo simulation tool (using GMS 3.5) was created to model electron energy loss (ionization and bremsstrahlung) and vacancy generation in diamond from keV to hundreds of MeV.
    • The model explicitly accounts for secondary cascade processes (atom-atom collisions) and includes a 50% recombination rate for displaced carbon atoms.
  2. Extremely High Energy Irradiation (Sample 1):

    • Facility: ARES linear accelerator (DESY, Hamburg).
    • Substrate: Element6 HPHT diamond (3 x 3 x 0.3 mm3, [N] ≀200 ppm).
    • Beam Parameters: 155 MeV electrons, Gaussian profile (~500 ”m diameter), 10 Hz repetition rate, up to 120 pC per pulse.
    • Process: Irradiated for 96 hours to achieve a target fluence of 1.5 · 1018 e/cm2.
  3. Low Energy Irradiation (Comparison Samples):

    • Facility: Talos F200S Transmission Electron Microscope (TEM) (EPFL).
    • Substrates: HPHT ([N] ≀200 ppm) and CVD ([N] ≀1 ppm).
    • Beam Parameters: 200 keV electrons, homogeneous 15 ”m diameter beam.
    • Process: Ten different areas on each substrate were irradiated, covering fluences from 1 · 1016 to 5 · 1020 e/cm2.
  4. Thermal Annealing:

    • Method: Conventional low-pressure thermal annealing applied to all irradiated samples.
    • Parameters: 800 °C for 4 hours under P = 10-6 mbar (to mobilize vacancies and form NV centers).
  5. Characterization Techniques:

    • Photoluminescence (PL) Spectroscopy: Used to quantify absolute [NV-] concentration (via ZPL peak area comparison to a calibrated sample) and determine the charge state conversion efficiency (Ο) using Debye-Waller decomposition.
    • Raman Spectroscopy (785 nm): Used to assess lattice damage (monitoring FWHM, peak shift, and background signal).
    • Optically Detected Magnetic Resonance (ODMR): Continuous wave measurements used to extract linewidth, contrast, and calculate the shot-noise limited sensitivity (η).
    • T1 Relaxometry: All-optical protocol used to measure the longitudinal spin relaxation time T1, characterizing the spin environment quality.

The ability to create high-density, uniform NV- ensembles over macroscopic volumes using ultra-high energy electron irradiation is highly relevant for several commercial and industrial sectors:

  • Quantum Sensing and Metrology:
    • High-Sensitivity Ensemble Sensors: Manufacturing high-performance magnetometers, electrometers, and gyroscopes that rely on large numbers of NV centers to achieve high signal-to-noise ratios (SNR) and absolute sensitivity.
    • Medical and Biological Imaging: Developing large-area diamond sensors for high-resolution magnetic field mapping (e.g., in magnetoencephalography or NMR).
  • Industrial Diamond Processing:
    • Cost Reduction in Batch Production: The >10 cm penetration depth allows hundreds of diamond wafers or substrates to be stacked and irradiated simultaneously in a single accelerator run, significantly lowering the cost per substrate compared to low-energy methods.
  • Advanced Materials Engineering:
    • Heterostructure Integration: Enabling the creation of NV centers within complex diamond-based heterostructures (e.g., integrated quantum circuits) by minimizing electron absorption and scattering damage in surrounding non-diamond layers.
  • Diamond Defect Engineering Research:
    • The methodology provides a scalable tool for generating high concentrations of vacancies and studying their aggregation states (e.g., vacancy clusters) and their impact on spin properties (T1), which is crucial for optimizing future quantum materials.
View Original Abstract

Abstract Single‐crystal diamond substrates presenting a high concentration of negatively charged nitrogen‐vacancy centers (NV − ) are on high demand for the development of optically pumped solid‐state sensors such as magnetometers, thermometers, or electrometers. While nitrogen impurities can be easily incorporated during crystal growth, the creation of vacancies requires further treatment. Electron irradiation and annealing is often chosen in this context, offering advantages with respect to irradiation by heavier particles that negatively affect the crystal lattice structure and consequently the NV − optical and spin properties. A thorough investigation of electron irradiation possibilities is needed to optimize the process and improve the sensitivity of NV‐based sensors. In this work, the effect of electron irradiation is examined in a previously unexplored regime: extremely high energy electrons, at 155 MeV. A simulation model is developed to estimate the concentration of created vacancies and an increase of NV − concentration by more than three orders of magnitude following irradiation of a nitrogen‐rich HPHT diamond over a very large sample volume is experimentally demonstrated, which translates into an important gain in sensitivity. Moreover, the impact of electron irradiation in this peculiar regime on other figures of merits relevant for NV sensing is discussed, including charge state conversion efficiency and spin relaxation time. Finally, the effect of extremely high energy irradiation is compared with the more conventional low energy irradiation process, employing 200 keV electrons from a transmission electron microscope, for different substrates and irradiation fluences, evidencing 60‐fold higher yield of vacancy creation per electron at 155 MeV.