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Oxidized Silicon Terminated Diamond p-MOSFETs with Channel Mobility >150 cm2V-1s-1 and |VTH|> 3V Normally-off for Complementary Power Circuits

MetadataDetails
Publication Date2023-12-09
AuthorsHiroshi Kawarada, Kosuke Ota, Yu Fu, Ayumi Narita, Xiaohua Zhu
InstitutionsWaseda University
Citations4

Oxidized silicon terminated (C-Si-O) diamond surface has been applied for lateral and vertical MOSFETs. C-Si-O bonds instead of C-O-Si bonds are key to fabricate higher channel mobility of diamond p channel MOSFETs (p-MOSFETs). The hole channel mobility exceeds 150 cm <sup xmlns:mml=“http://www.w3.org/1998/Math/MathML” xmlns:xlink=“http://www.w3.org/1999/xlink”&gt;2&lt;/sup> V <sup xmlns:mml=“http://www.w3.org/1998/Math/MathML” xmlns:xlink=“http://www.w3.org/1999/xlink”&gt;-1&lt;/sup> s <sup xmlns:mml=“http://www.w3.org/1998/Math/MathML” xmlns:xlink=“http://www.w3.org/1999/xlink”&gt;-1&lt;/sup> which is higher than the electron mobility of SiC n-MOSFETs. The threshold voltage V <inf xmlns:mml=“http://www.w3.org/1998/Math/MathML” xmlns:xlink=“http://www.w3.org/1999/xlink”&gt;TH&lt;/inf> of diamond p-MOSFET is negatively large enough (V <inf xmlns:mml=“http://www.w3.org/1998/Math/MathML” xmlns:xlink=“http://www.w3.org/1999/xlink”&gt;TH&lt;/inf> < -3V) for normally-off operation at high voltage circuits. Maximum drain current densities I <inf xmlns:mml=“http://www.w3.org/1998/Math/MathML” xmlns:xlink=“http://www.w3.org/1999/xlink”&gt;D,Max&lt;/inf> were >300 mAmm <sup xmlns:mml=“http://www.w3.org/1998/Math/MathML” xmlns:xlink=“http://www.w3.org/1999/xlink”&gt;-1&lt;/sup> in lateral FETs and >200 mAmm <sup xmlns:mml=“http://www.w3.org/1998/Math/MathML” xmlns:xlink=“http://www.w3.org/1999/xlink”&gt;-1&lt;/sup> in vertical FETs. They are the highest in normally-off operation of diamond p-FETs.

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