Mask-less lithography of diamond films using shaped ultrafast UV pulses
At a Glance
Section titled âAt a Glanceâ| Metadata | Details |
|---|---|
| Publication Date | 2017-06-01 |
| Authors | E. Granados, Miguel MartĂnez-CalderĂłn, M. GĂłmez-Aranzadi, Ainara RodrĂguez, Richard P. Mildren |
| Institutions | SLAC National Accelerator Laboratory, Centro de Estudios e Investigaciones TĂ©cnicas de Gipuzkoa |
Abstract
Section titled âAbstractâAtomic-scale manipulation of carbon based surfaces, such as diamond, has an enormous potential for the construction of future nano-scale, photonic and optoelectronic devices. Diamond, when compared to other group IV covalent semiconductors, is particularly interesting; not only its tightly packed and strongly bound crystal lattice is an ideal environment for extreme physics, but it also offers advantages in terms of heat conductivity, hardness and transparency for multitude of applications. The development of diamond transistors [1], single photon sources for quantum computation based on diamond [2] or high power diamond optics and lasers [3] have benefited from developments on high precision diamond processing greatly.