Preparation and characterization of ultrananocrystalline diamond films in H2/Ar/CH4gas mixtures system with novel filament structure
At a Glance
Section titled “At a Glance”| Metadata | Details |
|---|---|
| Publication Date | 2015-01-01 |
| Journal | 中南大学学报：英文版 |
| Authors | 丰杰, 李莎莎, 罗浩, 魏秋平, WANG BING |
Abstract
Section titled “Abstract”Diamond films were prepared by hot filament chemical vapor deposition(HFCVD) in a gas mixtures system of methane, argon and hydrogen. The composition and morphology in different deposition pressures and filament structures were investigated, as well as the friction and wear-resistant properties. The sp3-bonded content was measured and nano-mechanics properties were also tested. Results of atomic force microscopy and X-ray photoelectron spectroscopy show that the diamond films whose surface roughness is less than 10 nm and sp3-bonded content is greater than 70% can be prepared by bistratal filament structure with optimized proportion of Ar. It is also shown that the friction coefficient of diamond films is 0.13 and its wear-resistant property is excellent. Nano-mechanics of films shows that its elastic modulus is up to 650 MPa and hardness can reach higher than 60 GPa. The diamond films with excellent performance have a broad application prospect in microelectromechanical systems(MEMS).
Tech Support
Section titled “Tech Support”Original Source
Section titled “Original Source”- DOI: None