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Control of edge bulge evolution during photoresist reflow and its application to diamond microlens fabrication

At a Glance

Section titled ā€œAt a Glanceā€
MetadataDetails
Publication Date2016-03-01
JournalJournal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena
AuthorsHangyu Liu, Johannes Herrnsdorf, Erdan Gu, Martin D. Dawson
InstitutionsUniversity of Strathclyde
Citations14

Abstract

Section titled ā€œAbstractā€

The authors present an empirical study of profile evolution of lithographically defined photoresist (PR) patterns during thermal reflow and apply the findings to diamond microlens fabrication. During PR reflow, a bulge forms at the edge of the PR pattern and propagates inwards as the temperature and PR thickness are increased. An empirical relationship for this propagation is derived. Furthermore, it was found that at a certain reflow temperature and a limited pattern size, there is a minimum initial thickness of the PR pattern for forming spherical lens profiles. Based on these findings, diamond microlenses with a diameter of 400 Ī¼m and a previously unachieved radius of curvature of over 13 mm were fabricated. This is underpinned by forming PR microlens patterns with a large radius of curvature and transferring the PR patterns through low-selectivity Ar/Cl2 inductively coupled plasma etching.

Tech Support

Section titled ā€œTech Supportā€

Original Source

Section titled ā€œOriginal Sourceā€

References

Section titled ā€œReferencesā€
  1. 1998 - The Nature of Diamonds

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