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Effect of a radical exposure nitridation surface on the charge stability of shallow nitrogen-vacancy centers in diamond

MetadataDetails
Publication Date2017-04-06
JournalApplied Physics Express
AuthorsTaisuke Kageura, Kanami Kato, Hayate Yamano, Evi Suaebah, Miki Kajiya
InstitutionsGunma University, Waseda University
Citations30

A nitridation process of a diamond surface with nitrogen radical exposure far from the radio-frequency plasma for the stabilization of a negatively charged nitrogen-vacancy (NVāˆ’) centers near the surface is presented. At a nitrogen coverage of as high as 0.9 monolayers, high average Rabi contrasts of 0.40 ± 0.06 and 0.46 ± 0.03 have been obtained for single NVāˆ’ centers formed by shallow nitrogen implantation with acceleration voltages of 1 and 2 keV, respectively. This indicates that nitrogen termination by a radical exposure process produces an electric charge state suitable for single NVāˆ’ centers near the surface compared with the states obtained for alternatively terminated surfaces.