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6CCVD Research

Freestanding nanostructures via reactive ion beam angled etching

At a Glance

Section titled “At a Glance”
MetadataDetails
Publication Date2017-05-01
JournalAPL Photonics
AuthorsHaig A. Atikian, Pawel Latawiec, Michael J. Burek, Young-Ik Sohn, Srujan Meesala
InstitutionsÉcole de Technologie SupĂ©rieure, Harvard University
Citations57

Abstract

Section titled “Abstract”

Freestanding nanostructures play an important role in optical and mechanical devices for classical and quantum applications. Here, we use reactive ion beam angled etching to fabricate optical resonators in bulk polycrystalline and single crystal diamond. Reported quality factors are approximately 30 000 and 286 000, respectively. The devices show uniformity across 25 mm samples, a significant improvement over comparable techniques yielding freestanding nanostructures.

Tech Support

Section titled “Tech Support”

Original Source

Section titled “Original Source”

References

Section titled “References”
  1. 2004 - Epitaxy: Physical Principles and Technical Implementation
  2. 2007 - Heteroepitaxy of Semiconductors: Theory, Growth, and Characterization

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