Polycrystalline Diamond Films produced by Hot-Filament Chemical Vapor Deposition
At a Glance
Section titled âAt a Glanceâ| Metadata | Details |
|---|---|
| Publication Date | 2017-07-01 |
| Journal | Microscopy and Microanalysis |
| Authors | M. Josefina Arellano-JimĂ©nez, JesĂșs J. Alcantar-Peña, J.E. Ortega Aguilar, Miguel JosĂ© YacamĂĄn, Orlando Auciello |
| Institutions | The University of Texas at Dallas, The University of Texas at San Antonio |
| Citations | 4 |
Abstract
Section titled âAbstractâDiamond polycrystalline films have shown a unique combination of properties such as high wear resistance, high hardness, the lowest friction coefficient compared to metal and ceramic coatings, chemical inertness, excellent thermal conductivity, tunable electronic properties, and biocompatible properties.Moreover, Ultrananocrystalline diamond (UNCD) films exhibit high electrical conductivity with either nitrogen incorporated in grain boundaries or boron doping via substitution of B for C atoms in the diamond lattice [1]; such properties enable a broad range of applications directed to a new generation of mechanical, electronic, energy generation, and bio-medical devices.Hot-filament chemical vapor deposition (HFCVD) has been used to grow diamond films with various microstructures at different substrate temperatures.The systematic study of substrate-filament distance, substrate temperature, and chemical environment between substrate and filaments has been performed with in this work.