Diamond Deposition on Graphite in Hydrogen Microwave Plasma
At a Glance
Section titled āAt a Glanceā| Metadata | Details |
|---|---|
| Publication Date | 2018-08-16 |
| Journal | Journal of Coating Science and Technology |
| Authors | Jiaqi Zhu, Kaili Yao, Bing Dai, Victor Ralchenko, Guoyang Shu |
| Institutions | Harbin Institute of Technology, Prokhorov General Physics Institute |
| Citations | 4 |
Abstract
Section titled āAbstractāHydrogen plasma etching of graphite generates radicals that can be used for diamond synthesis by chemical vapor deposition (CVD). We studied the etching of polycrystalline graphite by a hydrogen microwave plasma, growth of diamond particles of the non-seeded graphite substrates, and characterized the diamond morphology, grain size distribution, growth rate, and phase purity. The graphite substrates served simultaneously as a carbon source, this being the specific feature of the process. A disorder of the graphite surface structure reduces as the result of the etching as revealed with Raman spectroscopy. The diamond growth rate of 3 - 5 Āµm/h was achieved, the quality of the produced diamond grains improving with growth time due to inherently nonstationary graphite etching process