Hybrid Diamond/Silicon Suspended Integrated Photonic Platform using SF6 Isotropic Etching
At a Glance
Section titled âAt a Glanceâ| Metadata | Details |
|---|---|
| Publication Date | 2019-12-01 |
| Authors | Parashara Panduranga, Aly Abdou, J. Richter, Evan L. H. Thomas, Soumen Mandal |
| Institutions | RWTH Aachen University, Bangor University |
Abstract
Section titled âAbstractâA hybrid diamond/silicon air-clad ridge waveguide platform is demonstrated. The air-clad structure coupled with the wide transmission window of diamond can allow for the use of this architecture over a large wavelength range, especially for the longer infrared wavelengths. In order to provide vertical confinement, the silicon substrate was isotropically etched using S F6 plasma to create undercut diamond films. An in-depth analysis of the etch characteristics of this process was performed to highlight its potential to replace wet isotropic etching or XeF 2 isotropic vapour phase etching techniques. The performance of the waveguide at 1550 nm was measured, and yielded an average loss of 4.67 +/- 0.47 dB/mm.