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Формирование многослойных наноструктур NV-центров в монокристаллическом CVD-алмазе

MetadataDetails
Publication Date2020-01-01
JournalПисьма в журнал технической физики
AuthorsА.М. Горбачев, М.А. Лобаев, Д.Б. Радищев, А.Л. Вихарев, С.А. Богданов
AnalysisFull AI Review Included

This research details the successful fabrication and characterization of periodic, multilayer Nitrogen-Vacancy (NV) center nanostructures within single-crystal Chemical Vapor Deposition (CVD) diamond, targeting applications in quantum sensing.

  • Ultra-Sharp Interfaces: The CVD process achieved nitrogen-doped delta-layers with exceptionally sharp boundaries, measured to be less than 1 nm thick, confirmed via Secondary Ion Mass Spectrometry (SIMS).
  • Enhanced NV- Signal: Multilayer structures demonstrated a significant increase in the practically important NV- photoluminescence (PL) signal intensity compared to uniformly doped diamond layers with similar total nitrogen surface density.
  • Preserved Coherence: The spin coherence time (T2) remained high (up to 7.0 µs), comparable to or exceeding typical values for uniformly doped layers, indicating high material quality and low paramagnetic impurity concentration.
  • Optimized Structure: The study shows that the ratio of NV-/NV0 centers is influenced by the distance between the doped layers, suggesting that neighboring nitrogen donors affect the charge state recombination dynamics.
  • Methodological Advancement: The technique utilizes a specialized CVD reactor and low methane concentration (0.15%) growth conditions to ensure slow growth and atomically smooth surfaces, critical for precise delta-doping.
ParameterValueUnitContext
Interface Sharpness< 1nmThickness of the nitrogen-doped layer boundary (SIMS profile).
Substrate TypeHPHT (100)OrientationHigh Pressure High Temperature diamond used as seed.
Substrate Misorientation Angle0.8-1.2°Angle relative to the [100] crystallographic direction.
Base Nitrogen Concentration (Substrate)< 1015cm-3Background N concentration in the HPHT substrate.
Gas Mixture Pressure40TorrCVD growth condition.
Total Gas Flow950sccmCVD growth condition.
Methane Concentration (CH4)0.15%Low concentration ensures slow, atomic-smooth growth regime.
Nitrogen Concentration (N2)0.5-1.5%Doping gas concentration during layer growth.
T2 Coherence Time (Max, Sample NV7)7.0µsMeasured using spin echo technique.
T2 Coherence Time (Min, Sample S39)4.2µsMeasured using spin echo technique.
NV-/NV0 Ratio (S39, S17)~1.8RatioSimilar to uniformly doped sample S14.
NV-/NV0 Ratio (NV7)1.3RatioLower ratio observed in structures with greater layer separation.
Excitation Wavelength514nmDPSS laser used for PL and T2 measurements.
Excitation Power100mWPower used for PL measurements.
Sample S39: Layer Thickness12nmThickness of individual doped layers.
Sample S39: Period39nmDistance between doped layers.
Sample S39: N Concentration in Layer8.6 x 1018cm-3Nitrogen concentration within the doped layer.

The multilayer NV-center structures were fabricated and analyzed using the following specialized techniques:

  1. CVD Growth: Performed in a specialized CVD reactor previously developed for Boron delta-doping [5].
  2. Substrate Preparation: HPHT (100) diamond substrates were polished to achieve a precise misorientation angle (0.8-1.2°) to control nitrogen incorporation during growth.
  3. Growth Recipe: Slow growth rate was ensured by maintaining a low methane concentration (0.15%) to achieve atomically smooth CVD diamond surfaces [3].
  4. Doping Control: Periodic nitrogen doping was achieved by varying the N2 concentration (0.5-1.5%) in the gas mixture (H2/CH4) during the growth sequence.
  5. Nitrogen Profiling (SIMS): Concentration profiles were measured using Time-of-Flight Secondary Ion Mass Spectrometry (TOF.SIMS-5).
    • Data Correction: Raw SIMS data was corrected using a methodology that accounts for the Depth Resolution Function (DRF) to accurately reconstruct the true nitrogen concentration profile [8].
  6. Photoluminescence (PL) Spectroscopy: Spectra were measured using a Horiba Jobin Yvon FHR-1000 spectrometer with a 514 nm DPSS laser (1W max power).
    • Signal Isolation: The intensity of the NV- (637 nm) and NV0 (575 nm) zero-phonon lines (ZPLs) was measured relative to the broadband phonon sideband, allowing for clean isolation of the ZPL signal.
  7. Spin Coherence (T2) Measurement: Conducted using a confocal microscope setup [9] and the spin echo technique. Electron spin manipulation was performed using a 2-loop antenna (200 µm diameter).

The development of precisely controlled, multilayer NV-center nanostructures in diamond is critical for several high-value commercial and research applications:

  • High-Sensitivity Magnetometry: Creating sensors with high spatial resolution and enhanced signal intensity (due to increased NV- concentration) while maintaining long spin coherence times (T2).
  • Bio-Sensing and Imaging: Utilizing NV centers as biocompatible sensors for high-resolution temperature sensing and magnetic field mapping within biological systems.
  • Quantum Information Technology: Providing the foundational material for solid-state quantum computing and memory architectures that require NV centers to be placed with nanometer precision.
  • Advanced Diamond Electronics: Engineering diamond materials with tailored, depth-dependent electronic properties for specialized semiconductor and high-power RF devices.
View Original Abstract

Results of synthesis of multilayered nitrogen doped nanostructures, which consist of periodically located nitrogen-containing layers in monocrystalline CVD diamond, are presented. The possibility of creation of nitrogen doped layers with extremely abrupt interfaces, less than 1 nm, is demonstrated. Photoluminescence studies have shown that multilayered structures allow obtaining higher emission intensity of practically important NV- centers with spin coherence times close to homogeneously doped layers at the same nitrogen concentration.