Charge carrier trapping by dislocations in single crystal diamond
At a Glance
Section titled âAt a Glanceâ| Metadata | Details |
|---|---|
| Publication Date | 2020-03-23 |
| Journal | Journal of Applied Physics |
| Authors | M. Schreck, Patrik Ć Äajev, M. TrĂ€ger, M. Mayr, Theodor GrĂŒnwald |
| Institutions | GSI Helmholtz Centre for Heavy Ion Research, University of Augsburg |
| Citations | 33 |
Abstract
Section titled âAbstractâCharge carrier trapping in diamond crystals containing well-defined concentrations of dislocations was investigated by several complementary techniques. Samples with dislocation densities ndis between <1 Ă 107 and â1 Ă 109 cmâ2 were grown heteroepitaxially on Ir/YSZ/Si(001). In optical pump-probe experiments, ambipolar diffusion coefficients were determined from the decay of light-induced transient free carrier gratings. Modeling their variation with excitation density yielded trapping cross sections Ï of 29 and 10 nm for the dislocations and a stress-field-induced reduction in exciton binding energies from 80 to 73 and 60 meV at ndis = 1 Ă 108 and 1 Ă 109 cmâ2, respectively. The lifetime measured by induced absorption scaled proportional to 1/ndis with absolute values ranging from 0.1 to 10 ns. In the electrical measurements on two sets of detector slices, electron-hole pairs were excited by α-particles and transport was measured separately for electrons and holes. Both types of carriers showed fast transient current signals. The time constant of the additional slow component exclusively seen for holes was in agreement with the activation energy of boron acceptors. Their concentration of â0.5 ppb yielded Ï = 1.77 Ă 10â13 cm2 for charged point traps. Schubweg and carrier lifetime due to deep trapping roughly reproduced the 1/ndis trend. For electrons at 3 V/ÎŒm, a value Ï = 40 nm was deduced. Cross sections for holes were significantly smaller. Differences in hole trapping between the samples are attributed to charging of dislocations controlled by chemical impurities. Increase in lifetime at high voltages is explained by reduced capture cross sections for hot carriers.
Tech Support
Section titled âTech SupportâOriginal Source
Section titled âOriginal SourceâReferences
Section titled âReferencesâ- 1998 - Handbook of Industrial Diamonds and Diamond Films
- 2018 - Power Electronics Device Applications of Diamond Semiconductors
- 2014 - Diamond for particle and photon detection in extreme conditions
- 2014 - Large-area high-quality single crystal diamond [Crossref]
- 2008 - Synthesis of large single crystal diamond plates by high rate homoepitaxial growth using microwave plasma CVD and lift-off process [Crossref]
- 2014 - A 2-in. mosaic wafer made of a single-crystal diamond [Crossref]
- 1996 - Epitaxial growth of diamond on iridium [Crossref]
- 2008 - Transmission electron microscopy study of the very early stages of diamond growth on iridium [Crossref]
- 2017 - Ion bombardment induced buried lateral growth: The key mechanism for the synthesis of single crystal diamond wafers [Crossref]
- 2013 - Efficiency of dislocation density reduction during heteroepitaxial growth of diamond for detector applications [Crossref]