Imaging Topological Spin Structures Using Light-Polarization and Magnetic Microscopy
At a Glance
Section titled âAt a Glanceâ| Metadata | Details |
|---|---|
| Publication Date | 2021-02-17 |
| Journal | Physical Review Applied |
| Authors | Till Lenz, Georgios Chatzidrosos, Zhiyuan Wang, Lykourgos Bougas, Yannick Dumeige |
| Institutions | Czech Academy of Sciences, Institute of Physics, Centre National de la Recherche Scientifique |
| Citations | 25 |
| Analysis | Full AI Review Included |
Executive Summary
Section titled âExecutive SummaryâThis research introduces a novel, wide-field imaging platform that concurrently measures both the magnetization (M) and the resulting stray magnetic fields (B) of magnetic structures, addressing a critical challenge in spintronics research.
- Core Innovation: Developed a combined imaging modality integrating Magneto-Optic Kerr Effect (MOKE) microscopy for magnetization detection and Nitrogen-Vacancy (NV) diamond magnetometry for stray magnetic field detection.
- Non-Perturbative Sensing: The NV-based magnetometry is magnetically non-perturbative and operates over a broad range of environmental conditions (cryogenic to above room temperature).
- Addressing the Inverse Problem: Simultaneous MOKE/NV imaging provides complementary data, resolving the under-constrained inverse problem of reconstructing complex magnetic spin topologies solely from stray field measurements.
- Sensor Performance: The wide-field NV ensemble sensor achieves an average magnetometric sensitivity of approximately 2 ”T ”m/âHz.
- Sample Demonstration: Successfully imaged magnetic stripe domains in a multilayered ferromagnetic stack (Ta/CoFeB/MgO), demonstrating the ability to observe magnetic topology and its associated field distribution simultaneously.
- Operational Flexibility: The instrument is built upon a home-built inverted epifluorescence microscope, allowing for operation across a wide temperature range and under external magnetic and electrical fields.
Technical Specifications
Section titled âTechnical Specificationsâ| Parameter | Value | Unit | Context |
|---|---|---|---|
| Imaging Modality | Concurrent MOKE / NV-ODMR | N/A | Wide-field, epi-fluorescence microscope basis |
| NV Sensor Type | 14N-doped ensemble | N/A | 100 nm layer on 12C substrate |
| NV Density | ~1.2 x 1017 | cm-3 | Concentration in the sensor layer |
| NV Excitation Wavelength | 532 | nm | Diode laser (CW operation) |
| NV Excitation Power | â 80 | mW | Continuous Wave illumination |
| NV Zero-Field Splitting | â 2.87 | GHz | Ground state 3A2 (ms = 0 to ms = ±1) |
| 14N Hyperfine Splitting | â 2.16 | MHz | Used for simultaneous MW driving |
| Average Magnetometric Sensitivity (NV) | ~2 ”T ”m/âHz | ”T ”m/âHz | Within 40 x 40 ”m2 Field-of-View (FOV) |
| Polarimetric Sensitivity (MOKE) | ~50 prad ”m/âHz | prad ”m/âHz | Limited by mechanical instabilities |
| Spatial Resolution (NV) | â 2 | ”m | Limited by diamond-sample offset distance |
| MOKE Acquisition Time | 10 | ms/cycle | Typical exposure time per cycle |
| ODMR Sequence Time | 100 | ms/sequence | Typical exposure time per frequency point |
| Sample Saturation Magnetization (Ms) | â 760 | kA/m | Measured via SQUID at room temperature |
| Sample Stack Thickness (Total) | 13.08 | nm | Ta(5)/CoFeB(1)/Ta(0.08)/MgO(2)/Ta(5) |
| Objective | Olympus UplanFL N 60X | N/A | Working distance 0.2 mm |
| Effective Pixel Area | â 108 x 108 | nm2 | On the sample focal plane (using sCMOS camera) |
Key Methodologies
Section titled âKey MethodologiesâThe experiment relies on precise material synthesis and a custom-built optical setup enabling concurrent, switchable imaging modalities.
-
Magnetic Sample Synthesis:
- Multilayer ferromagnetic stack (Ta/Co20Fe60B20/Ta/MgO/Ta) grown on a Si/SiO2 substrate (500 ”m thickness) using DC magnetron sputtering (Singulus Rotaris system).
- The ultra-thin Ta insertion layer (0.08 nm) is used to fine-tune the perpendicular magnetic anisotropy.
-
NV Sensor Fabrication:
- A 100 nm thick 14N-doped layer was grown on an electronic-grade diamond substrate using Chemical Vapor Deposition (CVD).
- Vacancies were created via 25 keV He+ implantation (dose 1012 ions/cm2).
- NV formation was completed via vacuum anneal (900 °C, 2 hours), followed by O2 anneal (425 °C, 2 hours) for charge-state stabilization.
-
Optical and MW Setup:
- A home-built inverted epifluorescence microscope was used, employing a 532 nm diode laser (intensity stabilized via AOM/PID controller) for excitation.
- MW fields required for NV-ODMR were delivered via an omega-shaped stripline placed on the coverslip, amplified to 16 W (+43 dB).
- A bias magnetic field (Bz) was applied using a coil (radius 3 cm, producing ~6 G/A) supplied by a computer-controlled DC power supply.
-
NV Magnetic Imaging (ODMR):
- A Continuous Wave (CW) technique was employed, where optical polarization, MW drive, and spin-state readout occur simultaneously.
- To maximize sensitivity and drive all hyperfine resonances, three MW frequency components (separated by the 2.16 MHz hyperfine splitting) were applied simultaneously.
- The resulting NV Photoluminescence (PL) (650 nm longpass filtered) was collected by a scientific-CMOS camera.
-
MOKE Imaging (Magnetization):
- Polar MOKE configuration was used, sensing the magnetization component perpendicular to the sample surface.
- The setup incorporated two linear polarizers: one to prepare the incident green light and a second (analyzer) placed in front of the camera.
- The analyzer was optimized to be nearly crossed with the polarizer to achieve the best Signal-to-Noise Ratio (SNR).
-
Concurrent Operation:
- Switching between NV (magnetic field) and MOKE (magnetization) imaging was achieved using a computer-controlled flip mount to swap the longpass filter (for PL detection) with a neutral density filter (for reflected green light detection).
Commercial Applications
Section titled âCommercial ApplicationsâThis concurrent imaging technology is highly relevant for the research and development of next-generation magnetic and quantum technologies.
-
Spintronics and Topological Computing:
- Direct visualization and control of magnetic textures like skyrmions, domain walls, and vortices, which are foundational elements for high-density, non-volatile memory (MRAM) and logic devices.
- Measurement of interfacial effects, such as the Dzyaloshinskii-Moriya Interaction (DMI), critical for stabilizing topological spin structures.
-
Advanced Materials Characterization:
- Non-invasive, ambient-condition study of static and dynamic spin configurations in novel magnetic thin films and heterostructures.
- Understanding the interplay between spin-spin and spin-orbit interactions in correlated electron systems.
-
Quantum Sensing and Metrology:
- Development of robust, wide-field NV-diamond magnetometers for industrial applications requiring high sensitivity and spatial resolution outside of cryogenic environments.
-
Integrated Circuit (IC) Failure Analysis:
- Mapping current flow and localized magnetic fields within integrated circuits for defect detection and performance analysis, offering higher resolution than traditional methods.
-
Magnetic Storage Media Development:
- Characterization and quality control of magnetic nanoparticles and thin films used in high-density data storage.
View Original Abstract
We present an imaging modality that enables detection of magnetic moments and\ntheir resulting stray magnetic fields. We use wide-field magnetic imaging that\nemploys a diamond-based magnetometer and has combined magneto-optic detection\n(e.g. magneto-optic Kerr effect) capabilities. We employ such an instrument to\nimage magnetic (stripe) domains in multilayered ferromagnetic structures.\n