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Transport mechanism in O-terminated diamond/ZrO2 based MOSCAPs

MetadataDetails
Publication Date2021-12-04
JournalDiamond and Related Materials
AuthorsB. Soto, J. Cañas, M.P. Villar, D. AraĂșjo, Julien Pernot
InstitutionsInstitut Néel, Universidad de Cådiz
Citations9

Metal Oxide Semiconductor capacitors were fabricated using p-type O-terminated (001) diamond and zirconium
\ndioxide deposited by atomic layer deposition at low temperature (100 ◩C). X-ray diffraction and transmission
\nelectron microscopy evidence monoclinic structure and polycrystalline nature of the oxide layer. I-V, C-V and
\nC-F experiments have been performed in a large frequency range, i.e. from 1 Hz to 1 MHz, in order to analyse
\nthe electrical properties of the metal/dielectric/diamond stack. The presence of charges in the oxide and
\ninterface states induces a flat-band voltage shift in the C-V curve and a strong Fermi level pinning effect. A
\nleakage current mechanism considering the correlation of the microstructural characterization and the electrical
\nresponse is proposed.

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