Transport mechanism in O-terminated diamond/ZrO2 based MOSCAPs
At a Glance
Section titled âAt a Glanceâ| Metadata | Details |
|---|---|
| Publication Date | 2021-12-04 |
| Journal | Diamond and Related Materials |
| Authors | B. Soto, J. Cañas, M.P. Villar, D. AraĂșjo, Julien Pernot |
| Institutions | Institut Néel, Universidad de Cådiz |
| Citations | 9 |
Abstract
Section titled âAbstractâMetal Oxide Semiconductor capacitors were fabricated using p-type O-terminated (001) diamond and zirconium \ndioxide deposited by atomic layer deposition at low temperature (100 âŠC). X-ray diffraction and transmission \nelectron microscopy evidence monoclinic structure and polycrystalline nature of the oxide layer. I-V, C-V and \nC-F experiments have been performed in a large frequency range, i.e. from 1 Hz to 1 MHz, in order to analyse \nthe electrical properties of the metal/dielectric/diamond stack. The presence of charges in the oxide and \ninterface states induces a flat-band voltage shift in the C-V curve and a strong Fermi level pinning effect. A \nleakage current mechanism considering the correlation of the microstructural characterization and the electrical \nresponse is proposed.
Tech Support
Section titled âTech SupportâOriginal Source
Section titled âOriginal SourceâReferences
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