Impact of nitrogen doping on homoepitaxial diamond (111) growth
At a Glance
Section titled āAt a Glanceā| Metadata | Details |
|---|---|
| Publication Date | 2022-03-28 |
| Journal | Diamond and Related Materials |
| Authors | Yuta Nakano, Xufang Zhang, K. Kobayashi, Tsubasa Matsumoto, Takao Inokuma |
| Institutions | Kanazawa University |
| Citations | 15 |
Abstract
Section titled āAbstractāThe impacts of nitrogen (N) doping on the lateral growth mode during two-dimensional (2D) nucleation, on the growth rate, and the incorporation of nitrogen (concentration [N]) of (111)-oriented diamond films were investigated by modulating the [N2]/[CH4] gas admixture ratio. The 2D nucleation density first increased with increasing [N2]/[CH4] ratio between 0.02 and 20%. Further increase of the [N2]/[CH4] ratio to up 200% caused a decrease of the nucleation density. The growth rates showed the similar N-doping dependence as the nucleation density variation. This is attributed to an initial increase of CN radicals in the regime 0.02 to 20%, followed by a reduction of CHx radicals in the regime 20 to 200%. The nitrogen incorporation concentration increases with increasing the [N2]/[CH4] ratio. The highest nitrogen concentration with 2 Ć 1020 atoms/cm3 is detected with [N2]/[CH4] = 200% and a relatively low nucleation density is achieved. These results are beneficial for the optimized formation of nitrogen-vacancy centers used in a quantum metrology and for device application such as inversion-channel diamond MOSFETs.
Tech Support
Section titled āTech SupportāOriginal Source
Section titled āOriginal SourceāReferences
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