Nano-crystalline Diamond-Gated AlGaN/GaN HEMT
At a Glance
Section titled āAt a Glanceā| Metadata | Details |
|---|---|
| Publication Date | 2022-12-28 |
| Authors | Pranjali Vatsalaya |
| Institutions | Indian Institute of Technology Madras |
Abstract
Section titled āAbstractāAt room temperature, diamond has the highest thermal conductivity. With the existing thermal constraints observed in GaN-based devices, it is being evaluated as an alternative solution. This paper presents the thermal and electrical data collected at the wafer scale and illustrates the enhancement in these properties realized by integrating a Diamond substrate. The performance comparison of AlGaN/GaN high-electron-mobility transistors (HEMTs) on diamond and SiC substrates is also analyzed. However, using diamond substrates has limitations owing to availability, sample size, and thermal expansion mismatch coefficient. Therefore, a novel approach, termed ādiamond-before-gate;ā enhances the deposition processās thermal budget and facilitates large-area diamond without degrading the gate metal. AlGaN/GaN HEMT devices use Nano-crystalline diamond (NCD) thin films as heat-spreading capping layers. Observations show that the NCD-capped HEMTs exhibit almost 20% lesser device temperature. NCD-capped HEMTs demonstrated enhanced carrier density, hall mobility, sheet resistance, threshold voltage, reduced contact resistance, on-state resistance, trans-conductance, and breakdown voltage. Additionally, the effects of using a p+ Boron doped NCD also stated.
Tech Support
Section titled āTech SupportāOriginal Source
Section titled āOriginal SourceāReferences
Section titled āReferencesā- **** - Mitsubishi Electric Develops Worlds First Multi-Cell GaN-HEMT Bonded Directly to Diamond Substrate