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Low temperature electrical transport in thin carbon films deposited on SiO2/Si substrates by pulsed laser deposition

MetadataDetails
Publication Date2023-05-01
JournalJournal of Physics Conference Series
AuthorsE. Valcheva, Кiril Кirilov, Anna Dikovska, T. I. Milenov
InstitutionsInstitute of Electronics, Bulgarian Academy of Sciences
Citations1

Abstract In this paper electrical transport studies are performed on thin carbon films deposited on SiO 2 /Si substrates by pulsed laser deposition (PLD) applying laser ablation of micro-crystalline graphite target. Experiments were carried out on 320 - 420 nm thick SiO 2 on Si substrates as well as on hydrogenated diamond-like carbon (DLC) films deposited on SiO 2 /Si. Structural studies by means of XPS, SEM and Raman spectroscopy revealed that the films can be characterized as nano-sized carbon phases possessing different phase composition (i.e. the ratio sp 3 /sp 2 hybridized carbon, etc.). The electrical conductivity/resistivity of the films was measured in the temperature range 10 K < T < 300 K. Four-contact Van der Pauw method as well as two contact schemes have been applied. Some films have low room temperature resistivity in the range ρ = (0.1-1.5)Ɨ10 -3 Ī©.Ā·m and consist predominantly of sp 2 hybridized carbon with Raman spectra, which resemble that of nano-sized graphene depending on the deposition conditions and substrates used. The thinnest only 0.5 nm layer deposited directly on SiO 2 exhibits relatively low specific resistance (~10 -3 Ī©. m), which can be taken as an indication of good deposition conditions of graphene-like layers. The current flow mechanism was explored at temperatures from 300 K down to 10K. The temperature dependence reveals non-metallic behavior - the conductivity decreases at decreasing temperature as opposed to typical metal behaviour. A model of variable range hopping (VRH) mechanism is applied to explain the low temperature conductivity drawn from transport in nanocrystalline disordered systems.