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Simple Low-Temperature GaN/Diamond Bonding Process with an Atomically Thin Intermediate Layer

MetadataDetails
Publication Date2023-07-25
JournalACS Applied Nano Materials
AuthorsTakashi Matsumae, Sho Okita, Shoya Fukumoto, Masanori Hayase, Yuichi Kurashima
InstitutionsTokyo University of Science, National Institute of Advanced Industrial Science and Technology
Citations15

We demonstrated the low-temperature bonding of GaN and diamond substrates using wet chemical treatments. The GaN and diamond surfaces treated with HCl and NH4OH/H2O2 solutions, respectively, could adhere to each other by contact under atmospheric conditions. After annealing at 200 °C, they were bonded with a shear strength of 8.19 MPa. Interfacial observations revealed that the GaN and diamond crystallines were bonded through an ∼3 nm-thick amorphous layer consisting of Ga, O, and sp2-C. The proposed bonding process consists of wet chemical treatment followed by low-temperature annealing under atmospheric conditions. As this simple process enables GaN/diamond integration without adhesive layers, it would contribute to future high-power and high-frequency GaN devices integrated on the diamond heat spreader.

  1. 2014 - 2014 lester eastman Conference on high performance devices (LEC)